Abstract:Copper thin films have been deposited on Si substrates by molecular beam epitaxy (MBE) at different deposition rates varying from 1 up to 22 Å /s. X-ray reflectivity and y-2y measurements have shown that the surface roughness correlation length, the structural disorder and the grain dimensions are strongly affected by the deposition rate. Comparing these results with those obtained for sputtered deposited thin films with a low deposition rate (2.5 Å /s), a clear similarity between the MBE samples deposited wit… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.