2022
DOI: 10.1364/ome.468534
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High resolution femtosecond direct laser writing with wrapped lens

Abstract: Wrapped writing mode is a simple, inexpensive approach to multiphoton stereolithography. Standard ∼10 µm thin cling foil shields the objective from direct contact with the photoresist, without compromising writing resolution. A diffraction limited lateral voxel width below 150 nm was demonstrated through ray tracing simulations and electron microscopy using standard polymer photoresist. Wrapped mode, like dip-in printing, is not limited by the objective working distance height. Its utility to prototype new pri… Show more

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Cited by 7 publications
(3 citation statements)
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“…[ 604 ] To reduce the usage of materials, printing with a wrapped lens is a simple way while maintaining the high resolution. [ 762 ] Furthermore, other novel techniques like microfluidic‐assisted 3D printing, [ 501 ] sacrificial‐scaffold‐mediated TPL, [ 763 ] and mask‐assisted double‐sided TPL [ 764 ] could be used for specific optical element fabrications.…”
Section: Challenges and Perspectivementioning
confidence: 99%
“…[ 604 ] To reduce the usage of materials, printing with a wrapped lens is a simple way while maintaining the high resolution. [ 762 ] Furthermore, other novel techniques like microfluidic‐assisted 3D printing, [ 501 ] sacrificial‐scaffold‐mediated TPL, [ 763 ] and mask‐assisted double‐sided TPL [ 764 ] could be used for specific optical element fabrications.…”
Section: Challenges and Perspectivementioning
confidence: 99%
“…We use a Nanoscribe Photonic Professional GT direct laser writing machine on indium tin oxide‐coated glass substrates. For the fabrication of the different apertures, we use the wrapped femtosecond direct laser writing method [ 43 ] to avoid any contact of the material with the objective and possible coloring. We use the wrapped objective in dip‐in mode resulting in a constant beam path length through the material thus constant writing intensity in the focal spot.…”
Section: Materials Propertiesmentioning
confidence: 99%
“…Particularly in the field of micro-and nanooptical element and system processing, FsLDW shows various advantages compared to the aforementioned processing methods 44,45 . First, owing to its nonlinear multiphoton absorption characteristics, FsLDW exhibits processing accuracy beyond the diffraction limit 46 . It can process voxels smaller than 100 nm using sizeable numerical aperture (NA) objectives [47][48][49] .…”
Section: Introductionmentioning
confidence: 99%