2015
DOI: 10.1016/j.sna.2015.01.002
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High-resolution CPW fabricated by silver inkjet printing on selectively treated substrate

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Cited by 6 publications
(3 citation statements)
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“…Lee et al [165] . and later Kim et al [166] . improved silver pattern resolution by exposing spin‐coated fluorocarbon films to oxygen plasma.…”
Section: Tailoring the Substrate Surface Energy And Topologymentioning
confidence: 99%
“…Lee et al [165] . and later Kim et al [166] . improved silver pattern resolution by exposing spin‐coated fluorocarbon films to oxygen plasma.…”
Section: Tailoring the Substrate Surface Energy And Topologymentioning
confidence: 99%
“…The combination of chemical grafting methods and plasma or UV-ozone radiation can be used to develop methods for substrate microtexturing for inkjet printing applications (Figure 8). Lee et al [165] and later Kim et al [166] improved silver pattern resolution by exposing spin-coated fluorocarbon films to oxygen plasma. Depending on the conditions of plasma exposure (duration, power), the fluorocarbon layer is degraded and the hydrophilic/hydrophobic character of the substrate can be modulated.…”
Section: Borosilicatementioning
confidence: 99%
“…Generally, when we apply inkjet printing technology to fabrication of metal grid electrode, the fabrication process is simplified by directly-patterning of Ag nanoparticle and sintering. But, inkjet printing has limits to feature size and resolution due to nozzle size, jetting volume and ink spread [8,9]. For these reasons, it is difficult to apply an electrode-printing method to devices such as organic light emitting diodes (OLEDs), solar cells, thin film transistors, and radiofrequency identifications (RFID) requiring precision of 20 m or less [10].…”
Section: Introductionmentioning
confidence: 99%