High resolution 100kV electron beam lithography in SU-8

Bilenberg, Brian; Jacobsen, Søren; Schmidt, Michael; Skjolding, Lars Henrik; Shi, Peixiong; Bøggild, Peter; Tegenfeldt, Jonas O.; Kristensen, Anders

doi:10.1016/j.mee.2006.01.142

Cited by 85 publications

(66 citation statements)

References 14 publications

(13 reference statements)

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“…[15,16] In this study, we demonstrate that SU-8 can be modified to become a gel electrolyte. Modification of SU-8 with a lithium salt improves ionic conductivity without sacrificing patternability.…”

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confidence: 63%

Synthesis and Properties of a Photopatternable Lithium‐Ion Conducting Solid Electrolyte

et al. 2017

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in which the battery materials for the anode, cathode, and solid electrolyte are formed and defined spatially through lithography. The synthesis of metal oxide thin-film structures using photosensitive metallorganics is well known in the fields of optical waveguides, electronics, and sensors among others. [8][9][10] Titanium dioxide, a negative electrode for lithiumion batteries, has been synthesized via photopatterning with resolution down to 10 nm. [8] Furthermore, ternary and quaternary oxides have been demonstrated, suggesting that cathode materials such as lithium cobalt oxide may be attainable. [9,10] Research related to photopatternable solid electrolytes has largely focused on polymers that can be cross-linked in the presence of UV radiation. [11][12][13][14] However, these studies have not demonstrated the ability to pattern solid electrolytes directly on electrodes.SU-8 is an epoxy-based negative photoresist that is used in the fields of semiconductors, microfluidics, and MEMS due to its spatial resolution at the sub-30 nm level and ability to pattern high aspect-ratio structures. [15,16] In this study, we demonstrate that SU-8 can be modified to become a gel electrolyte. Modification of SU-8 with a lithium salt improves ionic conductivity without sacrificing patternability. SU-8 as a gel electrolyte demon strates a high ionic conductivity at room temperature along with good electrochemical stability, mechanical rigidity, and the ability to photopattern with micrometer-scale resolution.Initial studies of SU-8 focused on the effect of adding a lithium perchlorate salt (LiClO 4 ) to the crosslinked structure of SU-8 photoresist. During UV exposure, the eight epoxide groups in the SU-8 monomer were opened by acid generated by the photoinitiator ( Figure S1, Supporting Information). These groups then form ether linkages with neighboring end groups and crosslinking continues at elevated temperatures during the postexposure and hard bake. The fabrication of SU-8 and mSU-8 samples is depicted in Scheme S1 (Supporting Information). Fourier-transform infrared (FTIR) spectroscopy was used to quantitatively evaluate this process and to elucidate the structure of SU-8 polymer after the incorporation of LiClO 4 . Figure 1a shows the FTIR spectrum of the SU-8 films with different degrees of crosslinking and that of the mSU-8 film. Spectra are normalized to the benzene ring peak at 1608 cm −1 , which does not go through any chemical changes during the crosslinking process. The three characteristic absorption peaks One of the important considerations for the development of on-chip batteries is the need to photopattern the solid electrolyte directly on electrodes. Herein, the photopatterning of a lithium-ion conducting solid electrolyte is demonstrated by modifying a well-known negative photoresist, SU-8, with LiClO 4 . The resulting material exhibits a room temperature ionic conductivity of 52 µS cm −1 with a wide electrochemical window (>5 V). Half-cell galvanostatic testing of 3 µm thin films spin-coated on amorphou...

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confidence: 63%

Synthesis and Properties of a Photopatternable Lithium‐Ion Conducting Solid Electrolyte

et al. 2017

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“…Different mask-less lithography techniques are developed whose key advantage is the ability to change lithography patterns from one run to the next, without incurring the cost of generating a new photomask. Some of the maskless techniques include electron beam lithography (EBL), focused ion beam (FIB) lithography, scanning probe lithography (SPL), direct laser writing (DLW) technique, and dip pen lithography (DPL) [4][5][6][7][8]. Optical waveguides and devices using SU-8 material are of today's interest due to their potential applications in optical communications, optical interconnect, and integrated optics.…”

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confidence: 99%

Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

2017

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This work deals with SU-8 waveguides and waveguide structures fabricated on an oxidized silicon substrate using 'Focused ion beam (FIB) lithography'. From our experimentation it seems that FIB method is practically not suitable for fabricating long SU-8 waveguide structures, rather it is more suitable for nanoscale modification of already fabricated waveguides, such as, to fabricate photonic crystal structures.

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“…This photoresist, initially used for photolithography, soon was used as resist in X-ray lithography [1] e-beam lithography [2] and as mold material for soft lithography of thermosetting elastomers such as poly(dimethyl siloxane) (PDMS) [3]. Advantageous properties of this material including biocompatibility [4], relative ease of fabrication methods, high chemical [5], OPEN ACCESS mechanical [5] and thermal stability after processing [4,5] have found main applications in microelectromechanical systems (MEMS) and coatings and yet, applications are rapidly emerging today.…”

Section: Introductionmentioning

confidence: 99%

Novel SU-8/Ionic Liquid Composite for Tribological Coatings and MEMS

Batooli

Maldonado

Judelewicz³

et al. 2015

Micromachines

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Tribology of SU-8 polymer is increasingly relevant due to bursting use of this material in a variety of applications. This study is directed towards introduction and investigation of a novel self-lubricating composite of an ionic liquid (IL) in SU-8. The new material can be utilized for fabrication of lubricating polymer coating with tunable surface properties or SU8-made elements for microelectromechanical systems (MEMS) with enhanced tribological performance. It is shown that addition of IL drastically alters water affinity of the composite while UV patternability remains unmodified. A lower coefficient of friction and wear has been obtained for two investigated compositions with 4 and 10 wt % ionic liquid.

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High resolution 100kV electron beam lithography in SU-8

Cited by 85 publications

References 14 publications

Synthesis and Properties of a Photopatternable Lithium‐Ion Conducting Solid Electrolyte

Synthesis and Properties of a Photopatternable Lithium‐Ion Conducting Solid Electrolyte

Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

Novel SU-8/Ionic Liquid Composite for Tribological Coatings and MEMS

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