1997
DOI: 10.1049/el:19970112
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High reflectivity Te-doped GaAsSb/AlAsSb Bragg mirror for 1.5 [micro sign]m surface emitting lasers

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Cited by 23 publications
(8 citation statements)
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“…Recently, the GaAsSb system has gained attention because such structures can also be grown for device applications in the 1.55 m region. [6][7][8][9][10][11] As we show below, from the D'yakonov-Perel ͑DP͒ mechanism of spin relaxation, 12 the GaAsSb system is expected to exhibit Ͼ6 times shorter relaxation times than the InGaAs system, pointing to a possible subpicosecond response. Since this ultrafast relaxation is related to an intrinsic property of the system, devices with a switching time Ͻ250 fs would be attainable, without the need to use low-temperature growth or defectinduced recovery time reduction, which have the undesirable consequence of degraded optical nonlinearity at the band edge.…”
mentioning
confidence: 90%
“…Recently, the GaAsSb system has gained attention because such structures can also be grown for device applications in the 1.55 m region. [6][7][8][9][10][11] As we show below, from the D'yakonov-Perel ͑DP͒ mechanism of spin relaxation, 12 the GaAsSb system is expected to exhibit Ͼ6 times shorter relaxation times than the InGaAs system, pointing to a possible subpicosecond response. Since this ultrafast relaxation is related to an intrinsic property of the system, devices with a switching time Ͻ250 fs would be attainable, without the need to use low-temperature growth or defectinduced recovery time reduction, which have the undesirable consequence of degraded optical nonlinearity at the band edge.…”
mentioning
confidence: 90%
“…In the case of the AlGaAsSb/AlAsSb system on InP, type-I interfaces can be found between AlGaAsSb and AlAsSb layers (Г-X valleys) with barrier of ~0.47 eV and an type-II interface between the most inner AlGaAsSb layer and the InP substrate (Г-Г valleys) with barrier of ~0.31 eV (DIAS, 1997;GENTY, 1997). A schematic diagram of the band structure with alignment between conduction and valence bands of the AlAsSb materials (valley X, dotted line), AlGaAsSb and InP is presented in Figure 3.…”
Section: Resultsmentioning
confidence: 99%
“…Heterostructures from Sb family materials such as AlGaAsSb/AlAsSb with lattice matched to InP are considered as good alternative in the manufacturing of Bragg mirrors employed in vertical-cavity surface emitting lasers (VCSEL) in the region of 1.55 μm, (BLUM, 1995;DIAS, 1997;GENTY, 1997;DIAS, 1998). The high refractive index contrast (Δn) between alloys AlGaAsSb and AlAsSb allows the preparation of high-reflectivity Bragg mirrors (99%) required for VCSEL operation with a small number of periods (~20) (DIAS,1998).…”
mentioning
confidence: 99%
“…From the average power-scaling point of view, smaller number of heteroepitaxial layers is also desirable as the thermal conductivity of the stack decreases as the number of layers grows [59,60]. High-index-contrast lattice-matched gratings can be grown using GaAs/AlAs and GaAsSb/AlAsSb systems [51,61,62], where the index difference of about 0.55 and 0.61 can be achieved. The difficulty arises for QW-SAMs deemed for operation in an optical communications window of 1.5 μm where the lattice-matched InGaAs/InP QW would be a good option for the absorber layer.…”
Section: Quantum-well Saturable Absorbers: Overviewmentioning
confidence: 99%