High rate growth of thick diamond films by high-current hot-cathode PCVD

Bai, Yang; Jin, Zengsun; Lv, Xiaoyi; Jiang, Zhigang; Han, Xuemei; Wang, Jiayu; Wu, Huibin

doi:10.1016/j.jcrysgro.2005.04.008

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Cited by 6 publications

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“…Preparation of BDD electrodes was carried out in a DC-PCVD apparatus [4]. The substrates were sintering porous titanium in size of 15 mm ×15 mm×1 mm.…”

Section: Methodsmentioning

confidence: 99%

Synthesize Boron Doped Diamond Films on Porous Ti Substrates by DC-PCVD

Yin

Zhao

Zheng

et al. 2012

AMM

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Boron doped diamond (BDD) films were deposited on porous Ti substrates by direct current plasma chemical vapor deposition (DC-PCVD) system. For improve adhesion between diamond and porous Ti, and shorten diamond nucleation period, appropriate pretreatments were carried out. Micro diamond particles were mechanical embedded in the holes of porous Ti substrates and then nanodiamond powders were seeded on substrates by ultrasound sonication prior to deposition. The samples were examined by scanning electron microscopy (SEM), micro-Raman spectroscopy, and cyclic voltammetry. It was found that BDD films covered the whole porous Ti substrate surface, and exhibited the good electrochemical property.

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“…Preparation of BDD electrodes was carried out in a DC-PCVD apparatus [4]. The substrates were sintering porous titanium in size of 15 mm ×15 mm×1 mm.…”

Section: Methodsmentioning

confidence: 99%