High-rate deposition of ultra-thick silver film by hollow cathode magnetron sputtering

Tan, Jantao; Wang, Jun; Cao, Qing; Bi, Hailin; Wu, Jun; Wang, Xudi

doi:10.1016/j.vacuum.2023.112034

Cited by 3 publications

(1 citation statement)

References 23 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This software has already presented its capability for simulating the plasma sources as well as the electromagnetic fields and the particle trajectories [55]. It has also been extensively used to simulate MS devices [56][57][58][59][60][61][62] and other types of plasma sources such as gliding arc discharge [63], vacuum arc discharge [64], plasma arc welding [65], atmospheric plasma jet [66][67][68], dielectric barrier discharge [69], capacitively coupled plasma [70], inductively coupled plasma [71], microwave plasma [72] and electron cyclotron resonance plasma [73,74].…”

Section: Simulation Modelmentioning

confidence: 99%

Electron trapping efficiency of a magnetron sputtering cathode

Salahshoor

2024

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

A common feature of all types of magnetron sputtering assemblies is an effective confinement of electrons by an appropriate combination of electric and magnetic fields.Therefore, studying the motions of electrons in the fields of magnetron assemblies is of particular importance.Here, we systematically analyze the electron motions in front of a typical DC magnetron sputtering cathode.We first calculate the profiles of the magnetron's magnetic field for balanced and two types of unbalanced configurations.Then, we compute the profiles of the cathode's electric field before the gas discharge and after the plasma formation.A semi-analytical model is utilized to compute the plasma potential.We then track the motion of electrons released from the target and electrons produced through impact ionization of the background gas in the prescribed fields.A Monte Carlo model is implemented to consider electron-gas collisions and a mixed boundary condition is employed to account for electron-wall interactions.The study analyzes the impact of field profiles on the cathode's efficiency in trapping electron by examining electron escape from the magnetic trap and electron recapture at the target surface.It is shown that the presence of plasma in all configurations leads to a significant increase in the trapping efficiency and the ionization performance, as well as a decrease in the recapture probability.These effects are attributed to the high electric field developed in the cathode sheath.Moreover, we statistically analyze the trapping efficiency by illustrating the spatial distributions of electron locations in both axial and radial dimensions.It is demonstrated that during their azimuthal drift motion, the electrons released from the middle region at the target surface have the smallest range of axial and radial locations, in all configurations in the absence of plasma.Finally, the impact of field profiles on the average energies of electrons is discussed.

show abstract

Section: Simulation Modelmentioning

confidence: 99%

Electron trapping efficiency of a magnetron sputtering cathode

Salahshoor

2024

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

show abstract

The investigation of thickness-dependent mono-fractal, optical and optoelectronics properties of sputtered silver thin film for silicon solar cell

Kumar,

Shrivastav,

Escrig

et al. 2024

Vacuum

View full text Add to dashboard Cite

An Overview to Current Trends in Metal Oxide Thin Film Preparation Methods

AVŞAR

2023

International Journal of Chemistry and Technology

View full text Add to dashboard Cite

Thin film preparation and coatings technology has been gaining attention as there is an increasing demand to the functionalized novel materials. Surface design through catalytically active materials such as metal oxides or zeolites as thin films and application through coating provides unique properties to the substance and result novel materials physically and chemically differing from their bulk form. Design technologies allow the preparation of structurally ordered thin films and coatings. Currently, designed thin film materials and coatings have a wide application range such as catalysis, sensing, anti- reflective surfaces, photovoltaics, or specialty design for targeted applications. This study provides a brief overview to the preparation methods of catalytically active coatings and thin film substances, which might be of industrial relevance in the case of the design for targeted applications.

show abstract

High-rate deposition of ultra-thick silver film by hollow cathode magnetron sputtering

Cited by 3 publications

References 23 publications

Electron trapping efficiency of a magnetron sputtering cathode

Electron trapping efficiency of a magnetron sputtering cathode

The investigation of thickness-dependent mono-fractal, optical and optoelectronics properties of sputtered silver thin film for silicon solar cell

An Overview to Current Trends in Metal Oxide Thin Film Preparation Methods

Contact Info

Product

Resources

About