High-precision motion and alignment in an ion-beam proximity printing system

Stumbo, D. P.; Damm, G. A.; Sen, S.; Engler, D. W.; Fong, F‐O.; Wolfe, J. C.; Oró, J.

doi:10.1116/1.585852

Cited by 13 publications

(5 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Medium patterning was accomplished using IBPL [11,24], a high-throughput direct write lithography where a large array of ion beamlets shaped by a stencil mask is used to write an arbitrary periodic device pattern as illustrated in membrane [25] and driven by four high-voltage operational amplifiers enable the deflection of the ion beamlets to obtain an arbitrary high density pattern. A 120 nm thick layer of hydrogen silsesquioxane (HSQ), a high-resolution negative tone resist [26] (Fox-12 from Dow Corning), was spun onto magnetic multilayer coated wafers and baked at 90 • C for 4 min before loading the wafer into the IBPL system.…”

mentioning

confidence: 99%

Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications

et al. 2006

View full text Add to dashboard Cite

An approach to fabrication of a patterned magnetic recording medium for next generation data storage systems is presented. (Co/Pd)n magnetic multilayers are evaluated as candidates for patterned medium materials for their high and easily controllable magnetic anisotropy. The multilayer films deposited on a Ta seed layer enable high intergranular exchange coupling—an essential feature of a patterned magnetic recording medium. The quality of (Co/Pd)n superlattices was optimized via deposition conditions and monitored using low-angle x-ray diffraction. An estimated in-plane (hard-axis) magnetization saturation field in excess of 40 000 Oe was observed. Vertical (easy-axis) hysteresis loops for as-deposited continuous magnetic multilayers exhibited a low coercivity of 930 Oe, indicating highly uniform (magnetically) films with weak domain wall pinning. Ion-beam proximity lithography was used to pattern magnetic multilayers into 43 nm islands on a 135 nm pitch. Following patterning, easy-axis coercivity increased nearly 15-fold to 12.7 kOe.

show abstract

mentioning

confidence: 99%

Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications

et al. 2006

View full text Add to dashboard Cite

show abstract

“…For this example, reliable cuff diameters are obtained between 70 and 250 µm. After the cuff is fabricated, and gently unrolled, the electrodes lines are printed using large depth-of-field ion beam lithography in a negative-tone resist [7]- [8]- [9]. A 110 nm thick gold (Au) film is then deposited by DC-magnetron sputtering.…”

Section: Resultsmentioning

confidence: 99%

Self-closing Micro-Cuff for Neural Recording in the Locust

Sajedi¹,

Randhawa²,

Parikh³

et al. 2022

Proceedings of the 8th World Congress on New Technologies

View full text Add to dashboard Cite

We have developed a self-wrapping flexible cuff electrode for recording electrical activity on the descending contralateral movement detector (DCMD) neuron of the locust. First, a gold film is sputtered onto a monoaxially oriented polycarbonate membrane. Then, the resulting bilayer film is cut into individual strips parallel to the machine direction of the polycarbonate film. Thermally shrinking the polycarbonate at 155 0 C actuates the curl. This method can be used to fabricate controlled diameters between 50-250 µm; diameter is controlled by thickness of the two layers and the temperature and duration of the heat shrinking process. The cuffs are selfclosing, and do not require suturing for attachment to a nerve. The cuffs are carefully unrolled, a gold film deposited, and a plasmadeposited, ion-sensitive resist applied. A stencil mask is then used to define the metallization lines by 50 kV He + ion beam proximity lithography. Ion milling transfers the resist pattern to the metal film. Conformality of the resist and large depth-of-field of the lithography are key to high resolution patterning on these non-flat substrates. The dielectric overcoat is a layer of exposed resist, which simplifies the opening of the contact windows, and provides excellent biocompatibility.

show abstract

“…Because of the high in-plane stiffness of the mask and the ability to align through the mask, pattern-placement errors were less than 60 nm using this technique. [13,14] Other innovations for patterning curved surfaces include combining step-and-flash imprint lithography [15±17] and ion beam proximity printing [18] on substrates having a diameter of 1 in. (1 inch = 2.54 cm) with features as small as 1.2 lm, [12] and the use of steerable micromirrors to pattern silicon spheres having a diameter of 1 mm with micrometer-scale features (www.ballsemi.com).…”

Section: Introductionmentioning

confidence: 99%

Patterning Spherical Surfaces at the Two‐Hundred‐Nanometer Scale Using Soft Lithography

Paul

Prentiss

Whitesides³

2003

Adv Funct Materials

View full text Add to dashboard Cite

Two soft lithographic techniques—topographically directed photolithography (TOP) and near‐field contact‐mode photolithography—have been used to pattern spherical surfaces with features as small as 175 nm. Each technique has the ability to pattern more than a 60° arc of a spherical surface, albeit with distortions at the edge. Use as an optical polarizer demonstrates an application of these types of patterned surface.

show abstract

High-precision motion and alignment in an ion-beam proximity printing system

Cited by 13 publications

References 0 publications

Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications

Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications

Self-closing Micro-Cuff for Neural Recording in the Locust

Patterning Spherical Surfaces at the Two‐Hundred‐Nanometer Scale Using Soft Lithography

Contact Info

Product

Resources

About