High-Pixel-Density Fine Metal Mask Fabricated by Electroforming of Fe-Ni Alloy onto UV-nanoimprinted Resin Pattern on Si Substrate

Direct laser patterning of glass mask for micro display using GHz bursts

“…To solve this problem, it is necessary to develop a novel find shadow mask technology within a taper angle above 80°. As candidate technologies, laser‐patterned invar mask, electroforming fine metal mask, photolithography‐based silicon nitride masks, and hybrid nanoimprint wafer mask were reviewed these days 2,3 . In addition to these methods, fine glass mask using laser‐induced deep etching has also been researched, but there is a limit to reducing the pitch size of mask pattern due to the etching process 4 …”

“…As candidate technologies, laser-patterned invar mask, electroforming fine metal mask, photolithography-based silicon nitride masks, and hybrid nanoimprint wafer mask were reviewed these days. 2,3 In addition to these methods, fine glass mask using laser-induced deep etching has also been researched, but there is a limit to reducing the pitch size of mask pattern due to the etching process. 4 Micro-channel fabrication through glass material has been of great interest for future display, on account of the importance of having precision vias for electrical interconnections and other functional purposes.…”