Due to its large absorption coefficient and high carrier mobility, SnS exhibits strong promise in the area of optoelectronic devices. Nevertheless, the fabrication of large-area, high-quality films for SnS photodetectors (PDs) with superior photoresponse remains a formidable task, seriously limiting its further practical application. In the present study, a superior-performance broadband PD founded on the epitaxial SnS film. Large-area uniform SnS films were grown epitaxially on (100)-oriented KBr using magnetron sputtering technique, further exfoliated and transferred in a wafer size to fabricated two- terminal photodetector devices. Benefitting from high crystallization and unique photoconductive-bolometric coupling effect, the fabricated PDs exhibit a wide range of spectral response from the visible to near-infrared (NIR) wavelength (405 - 1550 nm), which is far beyond the limitation of the energy band gap. Particularly noteworthy is the SnS device we fabricated, which demonstrates an impressive responsivity of 95.5 A/W and a detectivity of 7.8×1011 Jones, outperforming other devices by 1-2 orders of magnitude. In addition, SnS PD shows excellent environmental durability. This work provides a robust approach to develop high-performance broadband SnS PDs, while simultaneously offering deep insight into the light-matter interactions.