High performance UV photodetector based on MoS2 layers grown by pulsed laser deposition technique

A review of molybdenum disulfide (MoS2) based photodetectors: from ultra-broadband, self-powered to flexible devices

“…The MoS 2 atomic layers were also prepared by different methods. Kumar et al 369 developed large-area MoS 2 layers using pulsed laser deposition (PLD) method which showed photoresponsivity of 3 Â 10 4 A W À1 and detectivity of 1.81 Â 10 14 Jones at 365 nm under 24 mW cm À2 incident light power at applied bias of 2.0 V. The photoresponsivity of the PLD-grown few-layer MoS 2 photodetectors was found to be 3 Â 10 4 , 1.08 Â 10 4 , 7.0 Â 10 3 , and 6.3 Â 10 3 A W À1 at 365, 436, 546, and 655 nm wavelengths under applied bias of 2 V, respectively. FL-MoS 2 photodetectors also showed low dark current of 10 À10 A and photoresponse of 1.37 Â 10 5 .…”

Recent Progress in the Synthesis of MoS2 Thin Films for Sensing, Photovoltaic and Plasmonic Applications: A Review

“…The authors stated that the addition of the MoS 2 coating is beneficial to the FEE process since lower electric fields were required to extract an electron current density of 10 µA/cm 2 (namely, 2.8 V/µm for MoS 2 -coated Si and~5.5 V/µm for MoS 2 -coated W tips). More recently, PLD has been used to fabricate high-quality MoS 2 films (monolayer to few layers) and integrated them into functional ultraviolet (UV) photodetectors [104]. The developed photodetectors were found to exhibit a very low dark current (~10 × 10 −10 A), low operating voltage (2 V), and good response time (32 ms).…”

Fabrication of Highly Photosensitive MoS2 Photodetector Films Using Rapid Electrohydrodynamic‐Jet Printing Process

“…Seongin Hong, Seungho Baek, Thi Thu Thuy Can, Woon-Seop Choi,* and Sunkook Kim* DOI: 10.1002/aelm.202101063 sensitive photodetectors due to its thickness-dependent bandgap (1.3-1.9 eV), high absorption coefficient, and superior carrier mobility (>100 cm 2 V −1 s −1 ) [9][10][11][12] With these attractive properties, MoS 2 films were obtained by mechanical or chemical exfoliation as well as chemical vapor deposition (CVD) and physical deposition such as radio frequency sputtering and pulsed laser deposition (PLD) for photodetectors. [13][14][15][16][17][18] However, the development of efficient and scalable synthesis method for MoS 2 film is still insufficient for practical applications. The inkjet printing technique is a promising method for the fabrication of MoS 2 films due to its scalability and speed.…”