2005
DOI: 10.1109/lpt.2005.846948
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High-performance three-layer 1.3-/spl mu/m InAs-GaAs quantum-dot lasers with very low continuous-wave room-temperature threshold currents

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Cited by 146 publications
(61 citation statements)
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“…In principle, a QD active region can couple every injected electron and hole to the lasing mode so that the change in gain per change in injected electron is increased over a planar well [2]. The advantages of quantum dots over quantum wells are due to their unique density of states resulting from three-dimensional confinement of carriers [3]. Ultralow threshold current and high temperature stability has been demonstrated for 1.3 lm selfassembled quantum dot (QD) lasers by many research groups [4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%
“…In principle, a QD active region can couple every injected electron and hole to the lasing mode so that the change in gain per change in injected electron is increased over a planar well [2]. The advantages of quantum dots over quantum wells are due to their unique density of states resulting from three-dimensional confinement of carriers [3]. Ultralow threshold current and high temperature stability has been demonstrated for 1.3 lm selfassembled quantum dot (QD) lasers by many research groups [4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%
“…Until recently QDs have been mainly optimized for different applications, such as for example for single-photon emitters [22], for low-threshold emitters [23], for multi-QD-layers SESAMs [24], for cavity quantum electrodynamics [25] or for quantum computations [26]. Here we operate in a completely different regime because we used low temperature (LT) MBE growth to obtain a fast recovery time.…”
Section: Introductionmentioning
confidence: 99%
“…The DFLs consisted of five-periods of 10-nm In 0.18 Ga 0.82 As/10-nm GaAs. After the DFLs a 400-nm GaAs spacer layer was deposited followed by an InAs/GaAs dot-in-a-well (DWELL) structure grown at ~510 °C, similar to that optimized on GaAs substrates [21][22][23]. The 5 DWELLs were embedded between two 100-nm GaAs layers grown at 580 °C and 50-nm AlGaAs layers grown at 610 °C.…”
Section: Epitaxial Growth and Defect Analysismentioning
confidence: 99%