High performance of compact radical monitoring probe in H2/N2 mixture plasma

Moon, Chang S.; Takeda, Keigo; Takashima, Seigo; Sekine, Makoto; Setsuhara, Yuichi; Shiratani, Masaharu; Hori, Masaru

doi:10.1116/1.3327926

Cited by 4 publications

(3 citation statements)

References 14 publications

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“…They also showed that the N atom density for pure N 2 was conversely lower than that for a mixture of H 2 and N 2 . 19,20) Compared with our results obtained here, the tendency of the absolute density of N radicals for pure N 2 discharge was oppositely larger in the remote N 2 discharge than that for the H 2 and N 2 mixture discharges. Thus, in our radical source configuration, that is, a large surface ratio to volume (430 Â 330 Â 330 mm 3 ), the remote density of N atoms was strongly sensitive to the surface loss probability since the N atoms were lost primarily on surfaces.…”

Section: Resultscontrasting

confidence: 72%

“…Moon and colleagues reported that the surface loss probabilities for N atoms on SUS were 0.04 for pure N 2 discharges and 0.16 for 20% H 2 in N 2 . 19,20) These results were taken by measurements of the decay of atomic density during the afterglow of pulsed discharges in a low-pressure high-density ICP reactor (300 Â 200 Â 200 mm 3 ). They also showed that the N atom density for pure N 2 was conversely lower than that for a mixture of H 2 and N 2 .…”

Section: Resultsmentioning

confidence: 99%

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Behaviors of Absolute Densities of N, H, and NH₃ at Remote Region of High-Density Radical Source Employing N₂–H₂ Mixture Plasmas

Chen

Kondo

Ishikawa

et al. 2011

Jpn. J. Appl. Phys.

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Parameters have been specified for electron beams with energies 5-45 MeV from a Brown Boveri betatron for use in computerised dosimetry calculations. A semi-empirical equation is given for the dose a t any point at various depths in water. This equation is a modification to Kawachi's predictive model which was based on solutions of a general age-diffusion equation. The depth doses and isodose curves are predicted as a function of the practical range, source skin distance (SSD) and field size. Depth dose accuracy requirements of f 2y0 above 50% depth dose and +_5% at lower doses, relative to maximum dose, have been set and achieved. Also, the shape of the isodose curves with the constrictions at higher doses and bulging a t lower values are accurately predicted. Computer calculated beams have been used to generate summed isodose distributions for certain clinical situations.

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Section: Resultscontrasting

confidence: 72%

Section: Resultsmentioning

confidence: 99%

Behaviors of Absolute Densities of N, H, and NH₃ at Remote Region of High-Density Radical Source Employing N₂–H₂ Mixture Plasmas

Chen

Kondo

Ishikawa

et al. 2011

Jpn. J. Appl. Phys.

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“…Jang and Lee 29 previously examined a few aspects in an inductively coupled H 2 -N 2 plasma by measuring n e , T e and ion signal intensities. In addition, there exists a variety of studies about H 2 -N 2 plasmas in which the densities of background gas species 13,20,[30][31][32][33] , radicals 7,8,20,32,34 , electrons 34,35 and ion signals 7,36 as well as the surface loss probability of H and N (see Ref. 7 ) were reported.…”

Section: Introductionmentioning

confidence: 99%

Measurement and modeling of neutral, radical, and ion densities in H2-N2-Ar plasmas

Sode

Jacob

Schwarz-Selinger

et al. 2015

Journal of Applied Physics

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A comprehensive experimental investigation of absolute ion and neutral species densities in an inductively coupled H 2 -N 2 -Ar plasma was carried out. Additionally, the radical and ion densities were calculated using a zero-dimensional rate equation model. The H 2 -N 2 -Ar plasma was studied at a pressure of 1.5 Pa and an rf power of 200 W. The N 2 partial pressure fraction was varied between f N 2 = 0 % and 56 % by a simultaneous reduction of the H 2 partial pressure fraction. The Ar partial pressure fraction was held constant at about 1 %. NH 3 was found to be produced almost exclusively on the surfaces of the chamber wall. NH 3 contributes up to 12 % to the background gas.To calculate the radical densities with the rate equation model it is necessary to know the corresponding wall loss times t wrad of the radicals. t wrad was determined by the temporal decay of radical densities in the afterglow with ionization threshold mass spectrometry during pulsed operation and based on these experimental data the absolute densities of the radical species were calculated and compared to measurement results.Ion densities were determined using a plasma monitor (mass and energy resolved mass spectrometer). H + 3 is the dominant ion in the range of 0.0 ≤ f N 2 < 3.4 %. For 3.4 < f N 2 < 40 % NH + 3 and NH + 4 are the most abundant ions and agree with each other within the experimental uncertainty. For f N 2 = 56 % N 2 H + is the dominant ion while NH + 3 and NH + 4 have only a slightly lower density. Ion species with densities in the range between 0.5 and 10 % of n i,tot are H + 2 , ArH + , and NH + 2 . Ion species with densities less than 0.5 % of n i,tot are H + , Ar + , N + , and NH + . Our model describes the measured ion densities of the H 2 -N 2 -Ar plasma reasonably well. The ion chemistry, i.e., the production and loss processes of the ions and radicals, are discussed in detail. The main features, i.e., the qualitative abundance of the ion species and the ion density dependence on the N 2 partial pressure fraction, are well reproduced by the model.

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Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy

Takeda

Ishikawa

Hori

2022

Rev. Mod. Plasma Phys.

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High performance of compact radical monitoring probe in H2/N2 mixture plasma

Cited by 4 publications

References 14 publications

Behaviors of Absolute Densities of N, H, and NH₃ at Remote Region of High-Density Radical Source Employing N₂–H₂ Mixture Plasmas

Behaviors of Absolute Densities of N, H, and NH₃ at Remote Region of High-Density Radical Source Employing N₂–H₂ Mixture Plasmas

Measurement and modeling of neutral, radical, and ion densities in H2-N2-Ar plasmas

Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy

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High performance of compact radical monitoring probe in H2/N2 mixture plasma

Cited by 4 publications

References 14 publications

Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N2–H2 Mixture Plasmas

Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N2–H2 Mixture Plasmas

Measurement and modeling of neutral, radical, and ion densities in H2-N2-Ar plasmas

Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy

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Product

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Behaviors of Absolute Densities of N, H, and NH₃ at Remote Region of High-Density Radical Source Employing N₂–H₂ Mixture Plasmas

Behaviors of Absolute Densities of N, H, and NH₃ at Remote Region of High-Density Radical Source Employing N₂–H₂ Mixture Plasmas