Abstract:Parameters have been specified for electron beams with energies 5-45 MeV from a Brown Boveri betatron for use in computerised dosimetry calculations. A semi-empirical equation is given for the dose a t any point at various depths in water. This equation is a modification to Kawachi's predictive model which was based on solutions of a general age-diffusion equation. The depth doses and isodose curves are predicted as a function of the practical range, source skin distance (SSD) and field size. Depth dose accura… Show more
“…In summary, the relatively high ammonia fraction of several percent was proven for a broad variation of plasma conditions. Chen et al 32 examined an inductively coupled plasma at 1 Pa and 400 W rf power. They measured the NH 3 density with a quadrupole mass spectrometer for plasma conditions comparable with the present study.…”
Section: B Ammoniamentioning
confidence: 99%
“…Jang and Lee 29 previously examined a few aspects in an inductively coupled H 2 -N 2 plasma by measuring n e , T e and ion signal intensities. In addition, there exists a variety of studies about H 2 -N 2 plasmas in which the densities of background gas species 13,20,[30][31][32][33] , radicals 7,8,20,32,34 , electrons 34,35 and ion signals 7,36 as well as the surface loss probability of H and N (see Ref. 7 ) were reported.…”
A comprehensive experimental investigation of absolute ion and neutral species densities in an inductively coupled H 2 -N 2 -Ar plasma was carried out. Additionally, the radical and ion densities were calculated using a zero-dimensional rate equation model. The H 2 -N 2 -Ar plasma was studied at a pressure of 1.5 Pa and an rf power of 200 W. The N 2 partial pressure fraction was varied between f N 2 = 0 % and 56 % by a simultaneous reduction of the H 2 partial pressure fraction. The Ar partial pressure fraction was held constant at about 1 %. NH 3 was found to be produced almost exclusively on the surfaces of the chamber wall. NH 3 contributes up to 12 % to the background gas.To calculate the radical densities with the rate equation model it is necessary to know the corresponding wall loss times t wrad of the radicals. t wrad was determined by the temporal decay of radical densities in the afterglow with ionization threshold mass spectrometry during pulsed operation and based on these experimental data the absolute densities of the radical species were calculated and compared to measurement results.Ion densities were determined using a plasma monitor (mass and energy resolved mass spectrometer). H + 3 is the dominant ion in the range of 0.0 ≤ f N 2 < 3.4 %. For 3.4 < f N 2 < 40 % NH + 3 and NH + 4 are the most abundant ions and agree with each other within the experimental uncertainty. For f N 2 = 56 % N 2 H + is the dominant ion while NH + 3 and NH + 4 have only a slightly lower density. Ion species with densities in the range between 0.5 and 10 % of n i,tot are H + 2 , ArH + , and NH + 2 . Ion species with densities less than 0.5 % of n i,tot are H + , Ar + , N + , and NH + . Our model describes the measured ion densities of the H 2 -N 2 -Ar plasma reasonably well. The ion chemistry, i.e., the production and loss processes of the ions and radicals, are discussed in detail. The main features, i.e., the qualitative abundance of the ion species and the ion density dependence on the N 2 partial pressure fraction, are well reproduced by the model.
“…In summary, the relatively high ammonia fraction of several percent was proven for a broad variation of plasma conditions. Chen et al 32 examined an inductively coupled plasma at 1 Pa and 400 W rf power. They measured the NH 3 density with a quadrupole mass spectrometer for plasma conditions comparable with the present study.…”
Section: B Ammoniamentioning
confidence: 99%
“…Jang and Lee 29 previously examined a few aspects in an inductively coupled H 2 -N 2 plasma by measuring n e , T e and ion signal intensities. In addition, there exists a variety of studies about H 2 -N 2 plasmas in which the densities of background gas species 13,20,[30][31][32][33] , radicals 7,8,20,32,34 , electrons 34,35 and ion signals 7,36 as well as the surface loss probability of H and N (see Ref. 7 ) were reported.…”
A comprehensive experimental investigation of absolute ion and neutral species densities in an inductively coupled H 2 -N 2 -Ar plasma was carried out. Additionally, the radical and ion densities were calculated using a zero-dimensional rate equation model. The H 2 -N 2 -Ar plasma was studied at a pressure of 1.5 Pa and an rf power of 200 W. The N 2 partial pressure fraction was varied between f N 2 = 0 % and 56 % by a simultaneous reduction of the H 2 partial pressure fraction. The Ar partial pressure fraction was held constant at about 1 %. NH 3 was found to be produced almost exclusively on the surfaces of the chamber wall. NH 3 contributes up to 12 % to the background gas.To calculate the radical densities with the rate equation model it is necessary to know the corresponding wall loss times t wrad of the radicals. t wrad was determined by the temporal decay of radical densities in the afterglow with ionization threshold mass spectrometry during pulsed operation and based on these experimental data the absolute densities of the radical species were calculated and compared to measurement results.Ion densities were determined using a plasma monitor (mass and energy resolved mass spectrometer). H + 3 is the dominant ion in the range of 0.0 ≤ f N 2 < 3.4 %. For 3.4 < f N 2 < 40 % NH + 3 and NH + 4 are the most abundant ions and agree with each other within the experimental uncertainty. For f N 2 = 56 % N 2 H + is the dominant ion while NH + 3 and NH + 4 have only a slightly lower density. Ion species with densities in the range between 0.5 and 10 % of n i,tot are H + 2 , ArH + , and NH + 2 . Ion species with densities less than 0.5 % of n i,tot are H + , Ar + , N + , and NH + . Our model describes the measured ion densities of the H 2 -N 2 -Ar plasma reasonably well. The ion chemistry, i.e., the production and loss processes of the ions and radicals, are discussed in detail. The main features, i.e., the qualitative abundance of the ion species and the ion density dependence on the N 2 partial pressure fraction, are well reproduced by the model.
“…Subsequently the H* radical anneal at a room temperature was carried out in next chamber equipped with the source of high-density hydrogen atoms, namely the high-density radical source (HDRS). Details of this source have been published elsewhere [4].…”
“…The radical exposure chamber is equipped with a high-density radical source, which has been developed by our group, with a radical density one order of magnitude higher than those of conventional sources. 20 The absolute density of ground state H radicals at the sample position was measured by vacuum ultraviolet absorption spectroscopy. 21 Although both ground-and excited-state H radicals irradiate the sample, we consider that the H radicals in the ground-state are the most effective species in the reaction due to their long lifetime.…”
Section: Copyright 2012 Author(s) This Article Is Distributed Under mentioning
The effect of in-situ exposure of n-GaN damaged by Cl2 plasma to atomic hydrogen (H radicals) at room temperature was investigated. We found that the PL intensities of the band-edge emission, which had been drastically reduced by plasma-beam irradiation at a Cl ion dose of 5 × 1016 cm−2, recovered to values close to those of as-grown samples after H radical exposure at a dose of 3.8 × 1017 cm−2. XPS revealed the appearance of a peak at a binding energy of 18.3 eV, which is tentatively assigned to Ga-H, and confirmed the removal of Cl after H radical exposure
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