2022
DOI: 10.1016/j.mtcomm.2022.103957
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High-performance memristor based on MoS2 for reliable biological synapse emulation

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Cited by 12 publications
(10 citation statements)
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References 39 publications
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“…42,43 The decay process can be divided into two coupling phases: a rapid phase with a short relaxation time constant ( τ 1 = 33 ms) and a subsequent slow phase with a large time constant ( τ 2 = 774 ms), 44–46 which are commensurate in scale with that observed in biological synapses. 47…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…42,43 The decay process can be divided into two coupling phases: a rapid phase with a short relaxation time constant ( τ 1 = 33 ms) and a subsequent slow phase with a large time constant ( τ 2 = 774 ms), 44–46 which are commensurate in scale with that observed in biological synapses. 47…”
Section: Resultsmentioning
confidence: 99%
“…42,43 The decay process can be divided into two coupling phases: a rapid phase with a short relaxation time constant (τ 1 = 33 ms) and a subsequent slow phase with a large time constant (τ 2 = 774 ms), [44][45][46] which are commensurate in scale with that observed in biological synapses. 47 We further demonstrate high-pass dynamics filtering using the STP properties of the device by applying multiple gate pulses with varying frequencies. As shown in Fig.…”
Section: Synaptic Characteristicsmentioning
confidence: 95%
“…Interestingly, we observed that increasing the fabrication temperature to 750 °C would lead to a highly uniform and dense distribution of VAN STO:MgO films as well as an important improvement in the film flatness. This is likely attributed to the improved crystallinity of STO and MgO at higher fabrication temperatures, leading to lower diffusion rate, smaller columnar grain structures, higher density, and better surface flatness …”
Section: Resultsmentioning
confidence: 99%
“…This is likely attributed to the improved crystallinity of STO and MgO at higher fabrication temperatures, leading to lower diffusion rate, smaller columnar grain structures, higher density, and better surface flatness. 36 Next, to investigate the RS behavior of STO:MgO-based memristors at different fabrication temperatures, we performed electrical measurements on the devices. The devices were subjected to direct current (DC) voltage applied to the top electrode while the bottom electrode was grounded.…”
Section: Rs Behaviors and Structural Characterizationsmentioning
confidence: 99%
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