“…To achieve high D *, the dark current density ( J d ) and consequentially noise current ( i n ) should be reduced. The elements causing J d are still widely discussed; however, some of its underlying mechanisms such as thermal generation, charge injection, trap-assisted tunneling, and recombination have been identified to largely influence its value. − Defects found in the bulk, at the surface, or interfaces of the active layer create defect states within the bandgap, which fuel such mechanisms, thereby increasing J d . Defects in the bulk have been attributed to Frenkel defects, dislocations, lattice strain, and migrating ions. − Instead, dangling bonds from grain boundaries, anionic vacancies (especially iodine vacancies), and interfaces have been blamed for the surface contribution. , Energy level alignment was also shown to dominate the charge injection mechanism: a larger energy difference (Δ E ) between the anode and perovskite conduction band (CB) suppresses injection and tunneling. , …”