High-Entropy Alloys Deposited by Magnetron Sputtering

Dolique, V.; Thomann, Anne-Lise; Brault, Pascal

doi:10.1109/tps.2011.2157942

Cited by 27 publications

(11 citation statements)

References 6 publications

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“…Although co-sputtering technique has been suggested to produce HEA films in some earlier reports4243, to our knowledge this work constitutes the first report of the formation of single-phase nanostructured refractory HEAs. Furthermore, the fabrication process for these thin films is fast and controllable: the alloy composition, film thickness and grain size can be tuned.…”

Section: Discussionmentioning

confidence: 89%

Ultrastrong ductile and stable high-entropy alloys at small scales

2015

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Refractory high-entropy alloys (HEAs) are a class of emerging multi-component alloys, showing superior mechanical properties at elevated temperatures and being technologically interesting. However, they are generally brittle at room temperature, fail by cracking at low compressive strains and suffer from limited formability. Here we report a strategy for the fabrication of refractory HEA thin films and small-sized pillars that consist of strongly textured, columnar and nanometre-sized grains. Such HEA pillars exhibit extraordinarily high yield strengths of ∼10 GPa—among the highest reported strengths in micro-/nano-pillar compression and one order of magnitude higher than that of its bulk form—and their ductility is considerably improved (compressive plastic strains over 30%). Additionally, we demonstrate that such HEA films show substantially enhanced stability for high-temperature, long-duration conditions (at 1,100 °C for 3 days). Small-scale HEAs combining these properties represent a new class of materials in small-dimension devices potentially for high-stress and high-temperature applications.

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Section: Discussionmentioning

confidence: 89%

Ultrastrong ductile and stable high-entropy alloys at small scales

2015

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“…A suitable method to form homogeneous, large area thin films is magnetron sputtering. HEAs have already been successfully sputtered from mosaic targets [8,9], loosely pressed powder targets [10][11][12] or sintered targets [13][14][15]. However, to the best of our knowledge, a direct comparison of HEA films fabricated from two differently prepared sputter targets used in the same system under equal conditions has not been reported so far.…”

Section: Introductionmentioning

confidence: 99%

CoCrFeNi High-Entropy Alloy Thin Films Synthesised by Magnetron Sputter Deposition from Spark Plasma Sintered Targets

et al. 2021

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Two magnetron sputter targets of CoCrFeNi High-Entropy Alloy (HEA), both in equal atomic ratio, were prepared by spark plasma sintering. One of the targets was fabricated from a homogeneous HEA powder produced via gas atomisation; for the second target, a mixture of pure element powders was used. Economic benefits can be achieved by mixing pure powders in the intended ratio in comparison to the gas atomisation of the specific alloy composition. In this work, thin films deposited via magnetron sputtering from both targets are analysed. The surface elemental composition is investigated by X-ray photoelectron spectroscopy, whereas the bulk stoichiometry is measured by X-ray fluorescence spectroscopy. Phase information and surface microstructure are investigated using X-ray diffraction and scanning electron microscopy, respectively. It is demonstrated that the stoichiometry, phase composition and microscopic structure of the as-deposited HEA thin films are almost identical if the same deposition parameters are used.

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“…Such functional coatings must have tailored physicochemical properties to fit the targeted application in fields such as mechanics, optics, electronics, and biomaterials. Various types of coatings can be produced, from pure metals to metal oxides, nitrides, carbides, oxynitrides to metal alloys, or chemically more complex combinations such as high-entropy alloys [ 24 – 25 ]. Also, the micro/nanostructure of the films is a very important aspect of the tailoring, and the sputtering process usually allows for controlling coating density, crystallinity, and micro/nanostructure to some extent by carefully varying the working parameters.…”

Section: Reviewmentioning

confidence: 99%

Sputtering onto liquids: a critical review

Sergievskaya¹,

Chauvin²,

Konstantinidis³

2022

Beilstein J. Nanotechnol.

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Sputter deposition of atoms onto liquid substrates aims at producing colloidal dispersions of small monodisperse ultrapure nanoparticles (NPs). Since sputtering onto liquids combines the advantages of the physical vapor deposition technique and classical colloidal synthesis, the review contains chapters explaining the basics of (magnetron) sputter deposition and the formation of NPs in solution. This review article covers more than 132 papers published on this topic from 1996 to September 2021 and aims at providing a critical analysis of most of the reported data; we will address the influence of the sputtering parameters (sputter power, current, voltage, sputter time, working gas pressure, and the type of sputtering plasma) and host liquid properties (composition, temperature, viscosity, and surface tension) on the NP formation as well as a detailed overview of the properties and applications of the produced NPs.

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High-Entropy Alloys Deposited by Magnetron Sputtering

Cited by 27 publications

References 6 publications

Ultrastrong ductile and stable high-entropy alloys at small scales

Ultrastrong ductile and stable high-entropy alloys at small scales

CoCrFeNi High-Entropy Alloy Thin Films Synthesised by Magnetron Sputter Deposition from Spark Plasma Sintered Targets

Sputtering onto liquids: a critical review

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