High-Efficiency Excitation of Spoof Surface Plasmon Polaritons Through Rectangular Waveguide Using Dipole Antenna

Zhu, Huali; Zhang, Yong; Ye, Longfang; Dang, Zhang; Xu, Ruimin; Yan, Bo

doi:10.1109/tap.2021.3137494

Cited by 6 publications

(2 citation statements)

References 22 publications

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“…The arti cial plasma is created by providing energy to free electrons in a gas, resulting in ionization and plasma formation in the reactor chamber, with different regions having distinct characteristics and properties [9][10][11][12]. The frequency of quartz components is adjusted by controlling the thickness of the quartz crystal thin lm, which, in turn, changes the oscillation frequency.…”

Section: Related Workmentioning

confidence: 99%

Effects of ion source etching on the impedance performances of quartz component

Yang,

Chang,

Tsai

et al. 2023

Preprint

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Quartz element (i.e., active quartz crystal oscillator or resonator) is coated on the quartz crystal with an Ag/Ni double-layer film. An ion source etching system is used to etch the Ag film surface of the quartz crystal through masks of different sizes. Three groups of masks were adopted for quartz crystal etching, the sizes of which are A (1.30×1.10 mm2), B (1.70×1.30 mm2), and C (2.42×1.62 mm2) with the remaining area not being etched. During the etching process, a frequency counter was connected to monitor the load resonance frequency (FL, MHz), load resonant frequency difference (FLD, ppm), resistance at series resonant frequency (RR, Ω, related to impedance performance). After ion source etching, the quartz element (mask A) corresponds to FLD (-385.5 ~ -256.8 ppm), and load resonant impedance RR ranges from 8.7 to 9.1 Ω, representing a 6.32% average impedance reduction. Using masks C, the quartz element corresponds to FLD (-282.9 ~ -241.1 ppm), and load resonant impedance RR ranges from 10.0 to 21.1 Ω. The average impedance divergence is 13.04 Ω. It is speculated that the size of the etching area of the quartz crystal using mask B or mask C was too large, and some remaining zones have been etched improperly, which led to an increase in impedance and also caused crystal frequency instability or oscillation failure. Precise etching and mask selection when producing quartz components is essential to maintain their functionality and stability.

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Section: Related Workmentioning

confidence: 99%

Effects of ion source etching on the impedance performances of quartz component

Yang,

Chang,

Tsai

et al. 2023

Preprint

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“…They are widely used for realizing different microwave components. Basically, SSPPs are researched for designing low-profile and broadband transmission waveguide devices [3]- [6]. Using the periodically corrugated grooves under odd mode excitation [4], low insertion loss transmission of less than 2 dB is realized in the 200 GHz band.…”

Section: Introductionmentioning

confidence: 99%

Spoof Surface Plasmon Polariton-Based Antenna and Array by Exciting Both Even- and Odd-Mode Resonances

Wen,

Hu,

Pang

et al. 2024

IEEE Trans. Antennas Propagat.

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Spoof surface plasmon polaritons (SSPPs) based antenna and array by exciting both even and odd mode resonances are developed and investigated in this paper. Different from others' work and for the first time, we use the separated corrugated grooves to achieve the consistent fundamental even and odd mode resonances on the same SSPPs aperture. In this way, the even and odd mode resonances can be operated in the same frequency band. Also for the first time, we introduce the SSPPs into an orthogonal-mode resonated antenna pursuing high isolated radiation. New challenges including the feed methods and impedance matching of two different resonant modes are overcome by introducing the capacitive patch and triangular cuts on the SSPPs. Finally, the SSPPs antenna and array were tested for performance investigation. It is found that in addition to the obtained wide overlapped impedance bandwidth of 14.8%, a very high isolation of 29 dB is achieved in the developed compact antenna element. The couplings between other antenna elements, radiation patterns, gains, and efficiencies of the array are also investigated. Both the measured and simulated results show that SSPPs and the developed antenna can be very appealing in MIMO applications owing to their orthogonal even-odd modes and compact structures.

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