Effects of ion source etching on the impedance performances of quartz component
Chih-Fu F. Yang,
Chih-Tsung Chang,
Yuan-Nan Tsai
et al.
Abstract:Quartz element (i.e., active quartz crystal oscillator or resonator) is coated on the quartz crystal with an Ag/Ni double-layer film. An ion source etching system is used to etch the Ag film surface of the quartz crystal through masks of different sizes. Three groups of masks were adopted for quartz crystal etching, the sizes of which are A (1.30×1.10 mm2), B (1.70×1.30 mm2), and C (2.42×1.62 mm2) with the remaining area not being etched. During the etching process, a frequency counter was connected to monitor… Show more
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