Several
transition metal oxides, including La1–x
Sr
x
CoO3, are
promising materials to realize resistive switching devices for neuromorphic
applications, as they can undergo a metal-to-insulator transition
(MIT) upon small perturbations to their electronic structure. Here,
we focus on the MIT induced by varying the oxygen vacancy concentration,
and we propose a model to predict the required electrical bias, based
on three fundamental quantities: the vacancy formation energy, the
permanent polarization in the material, and its dielectric constant.
We obtain these quantities using first-principles electronic structure
calculations, and we discuss strategies to minimize the electrical
bias which may be adopted experimentally to design and optimize neuromorphic
devices.