High density plasma processing of p-Hg&lt;inf&gt;0.7&lt;/inf&gt;Cd&lt;inf&gt;0.3&lt;/inf&gt;Te

Park, B.; Musca, Charles; Antoszewski, J.; Dell, John; Faraone, Lorenzo

doi:10.1109/commad.2006.4429931

2006 Conference on Optoelectronic and Microelectronic Materials and Devices 2006

DOI: 10.1109/commad.2006.4429931

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High density plasma processing of p-Hg<inf>0.7</inf>Cd<inf>0.3</inf>Te

B. Park

Charles Musca

J. Antoszewski

et al.

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High density plasma processing of p-Hg<inf>0.7</inf>Cd<inf>0.3</inf>Te

Cited by 1 publication

References 10 publications

A review on plasma-etch-process induced damage of HgCdTe

A review on plasma-etch-process induced damage of HgCdTe

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