High aspect ratio titanium nitride trench structures as plasmonic biosensor

Shkondin, Evgeniy; Repän, Taavi; Takayama, Osamu; Lavrinenko, Andrei V.

doi:10.1364/ome.7.004171

Cited by 59 publications

(44 citation statements)

References 56 publications

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“…As observed in Figure 2a, the growth rate is 0.097 ± 0.004 nm per cycle (or approx 9.7 nm per 100 cycles). TiN film density (Figure 2b) approaches the bulk density of TiN, 5.21 g/cm 3 , as film thickness increases. The TiN thin film prepared by 100 ALD cycles has an average density of 4.11 g/cm 3 while the TiN prepared by 300 and 400 cycles has a density of 5.19 and 5.11 g/cm 3 , respectively.…”

Section: Resultsmentioning

confidence: 87%

“…While the majority of plasmonics research has focused on noble metals, such as gold and silver, today there is a need to replace these traditional materials with alternatives to make commercially-viable plasmonic devices [1][2][3]. Transition metal nitrides, like titanium nitride (TiN), have proven to be promising due to their real permittivity values comparable to that of traditional metals in the visible range, and tunable optical properties by varying the processing methods and/or variables [4].…”

Section: Introductionmentioning

confidence: 99%

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Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3

et al. 2020

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Transition metal nitrides, like titanium nitride (TiN), are promising alternative plasmonic materials. Here we demonstrate a low temperature plasma-enhanced atomic layer deposition (PE-ALD) of non-stoichiometric TiN0.71 on lattice-matched and -mismatched substrates. The TiN was found to be optically metallic for both thick (42 nm) and thin (11 nm) films on MgO and Si <100> substrates, with visible light plasmon resonances in the range of 550–650 nm. We also demonstrate that a hydrogen plasma post-deposition treatment improves the metallic quality of the ultrathin films on both substrates, increasing the ε1 slope by 1.3 times on MgO and by 2 times on Si (100), to be similar to that of thicker, more metallic films. In addition, this post-deposition was found to tune the plasmonic properties of the films, resulting in a blue-shift in the plasmon resonance of 44 nm on a silicon substrate and 59 nm on MgO.

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Section: Resultsmentioning

confidence: 87%

Section: Introductionmentioning

confidence: 99%

Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3

et al. 2020

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“…On the other hand, top‐down approaches including focused ion‐beam milling and e‐beam lithography (Figure 1 III) have been used to process most of the nanohole structures reported 20–22. The feature size down to ≈20 nm with perfect periodicity over hundreds of micrometers has been demonstrated, along with various geometries including elliptical or squared‐hole,22 double‐hole, patched nanohole arrays6,23 nanoscale‐voids,24 as well as nanotrenches 25,26. However, these top‐down lithography methods involve tedious writing and processing, and limited scalability.…”

Section: Introductionmentioning

confidence: 99%

“…[20][21][22] The feature size down to ≈20 nm with perfect periodicity over hundreds of micrometers has been demonstrated, along with various geometries including elliptical or squared-hole, [22] double-hole, patched nanohole arrays [6,23] nanoscale-voids, [24] as well as nanotrenches. [25,26] However, these top-down lithography methods involve tedious writing and processing, and limited scalability. Overall, achieving sub-10 nm in feature size is still very challenging for the above methods and material systems have been extensively focused on noble metals such as Au.…”

Section: Introductionmentioning

confidence: 99%

Large‐Scale Plasmonic Hybrid Framework with Built‐In Nanohole Array as Multifunctional Optical Sensing Platforms

Wang

Shi

et al. 2020

Small

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Light coupling with patterned subwavelength hole arrays induces enhanced transmission supported by the strong surface plasmon mode. In this work, a nanostructured plasmonic framework with vertically built‐in nanohole arrays at deep‐subwavelength scale (6 nm) is demonstrated using a two‐step fabrication method. The nanohole arrays are formed first by the growth of a high‐quality two‐phase (i.e., Au–TiN) vertically aligned nanocomposite template, followed by selective wet‐etching of the metal (Au). Such a plasmonic nanohole film owns high epitaxial quality with large surface coverage and the structure can be tailored as either fully etched or half‐way etched nanoholes via careful control of the etching process. The chemically inert and plasmonic TiN plays a role in maintaining sharp hole boundary and preventing lattice distortion. Optical properties such as enhanced transmittance and anisotropic dielectric function in the visible regime are demonstrated. Numerical simulation suggests an extended surface plasmon mode and strong field enhancement at the hole edges. Two demonstrations, including the enhanced and modulated photoluminescence by surface coupling with 2D perovskite nanoplates and the refractive index sensing by infiltrating immersion liquids, suggest the great potential of such plasmonic nanohole array for reusable surface plasmon‐enhanced sensing applications.

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“…TiN is more abundant and cheaper than noble metals such Au, and offer the possibility of tuning its permittivity by varying deposition conditions and post-treatment. Moreover, TiN films can be deposited by the atomic layer deposition (ALD) technique, enabling conformal deposition of plasmonic and dielectric layers with nanometer precision and as a consequence realization of large-scale metamaterial structures with exceptional uniformity in large areas [5].…”

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confidence: 99%

Refractive Index Sensing by High Aspect Ratio Titanium Nitride Trench Structures

Shkondin

Repän

Lavrinenko

et al. 2018

Advanced Photonics 2018 (BGPP, IPR, NP, NOMA, Sensors, Networks, SPPCom, SOF)

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High aspect ratio titanium nitride trench structures as plasmonic biosensor

Cited by 59 publications

References 56 publications

Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3

Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3

Large‐Scale Plasmonic Hybrid Framework with Built‐In Nanohole Array as Multifunctional Optical Sensing Platforms

Refractive Index Sensing by High Aspect Ratio Titanium Nitride Trench Structures

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