High aspect ratio surface relief structures by photoembossing

Hermans, Ko; Wolf, Florian K.; Perelaer, Jolke; Janssen, Raj René; Schubert, Ulrich S.; Bastiaansen, Cees W. M.; Broer, Dirk J.

doi:10.1063/1.2799744

Cited by 28 publications

(39 citation statements)

References 15 publications

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“…In the second set of experiments, smooth corrugated polymer surfaces were created by means of a four-step process called photo-embossing [15]. First a so-called photo-polymer layer was spin-coated on glass forming layers approximately 20 µm thick.…”

Section: Methodsmentioning

confidence: 99%

Anisotropic Drop Morphologies on Corrugated Surfaces

et al. 2008

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The spreading of liquid drops on surfaces corrugated with micron-scale parallel grooves is studied both experimentally and numerically. Because of the surface patterning, the typical final drop shape is no longer spherical. The elongation direction can be either parallel or perpendicular to the direction of the grooves, depending on the initial drop conditions. We interpret this result as a consequence of both the anisotropy of the contact line movement over the surface and the difference in the motion of the advancing and receding contact lines. Parallel to the grooves, we find little hysteresis due to the surface patterning and that the average contact angle approximately conforms to Wenzel's law as long as the drop radius is much larger than the typical length scale of the grooves.

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Section: Methodsmentioning

confidence: 99%

Anisotropic Drop Morphologies on Corrugated Surfaces

et al. 2008

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“…However, the majority of these methods involve photoablation, 21-26 photopolymerization [27][28][29] or photocrosslinking. [30][31][32][33][34][35][36][37][38][39][40][41][42][43][44] Hence, reversible SRG formation has not been reported in these systems.…”

Section: Introductionmentioning

confidence: 99%

Facile one-step photopatterning of polystyrene films

Ubukata

Moriya

Yokoyama

2012

Polym J

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The development of nano-and micropatterned materials is a key component of advanced nanotechnology. We report herein, a photo-based method for patterning general-purpose polymer films. Patterned ultraviolet (UV) light irradiation of a thin polystyrene film under controlled temperature generates surface relief structures by mass transfer from shaded to irradiated areas. The resulting surface relief structure can be arbitrarily erased by heating and reconstructed by patterned UV light irradiation, and this process is repeatable. This new method thus enables fabrication of dynamic reversible patterning structures from various general polymers.

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“…[1] Recently, it has been reported that colorless large SR structures due to mass transfer can be fabricated using materials that do not contain azobenzene compounds. [14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33] It is considered that SR formation is concerned with photoreactioninduced internal diffusion processes. Recently, we have reported that the SR structure is fabricated by spatially patterned ultra-violet (UV) light, even in a general-purpose polystyrene (PS) film.…”

Section: Introductionmentioning

confidence: 99%