The optimal device structures and channel orientation for nanoscale strained-Ge heterostructure p-MOSFETs, are discussed through detailed Band-to-band-tunneling (including band structure and quantum effects), Low-field Mobility (k.p and Boltzmann Transport), Full-Band MonteCarlo, and 1-D Poisson -Schr枚dinger Simulations. The tradeoffs between drive current (ION), intrinsic delay ( ), band-to-band-tunneling (BTBT) leakage and short channel effects (SCE) have been systematically compared in high mobility strained-Ge Heterostructure FETs (HFETs).