2017
DOI: 10.1126/sciadv.1602640
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Heterojunction oxide thin-film transistors with unprecedented electron mobility grown from solution

Abstract: Engineering of solution-grown metal oxide heterointerfaces presents an alternative strategy for thin-film transistor development.

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Cited by 153 publications
(217 citation statements)
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References 58 publications
(106 reference statements)
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“…It is important to note that the use of a heterostructure semiconductor channel has been demonstrated to increase the electron mobility in metal‐oxide transistors (e.g., ZnO/In 2 O 3 and InZnO/AlSnZnInO ) in addition to controlled modulation doping of ZnO/In 2 O 3 . These techniques have resulted in unprecedented improvements to charge transport . A review is dedicated to this topic for the design of metal‐oxide heterostructures exhibiting two‐dimensional transport behavior .…”
Section: Introductionmentioning
confidence: 99%
“…It is important to note that the use of a heterostructure semiconductor channel has been demonstrated to increase the electron mobility in metal‐oxide transistors (e.g., ZnO/In 2 O 3 and InZnO/AlSnZnInO ) in addition to controlled modulation doping of ZnO/In 2 O 3 . These techniques have resulted in unprecedented improvements to charge transport . A review is dedicated to this topic for the design of metal‐oxide heterostructures exhibiting two‐dimensional transport behavior .…”
Section: Introductionmentioning
confidence: 99%
“…27 Despite the enhanced performance, the operating stability of HJ oxide TFTs has so far remained modest due to the persistent electronic defects present in the individual materials and at the heterointerfaces. [16][17][18] Since the operation 4 of these oxide HJ TFTs relies on the charge carriers transferred from the low-mobility layer on top of the high-mobility layer underneath, 4,26,27 the presence of electronic defects will deteriorate the device performance and its operational stability. Thus, reducing the electrontrap states within the HJ could potentially enhance the electron mobility and bias stability of the device.…”
mentioning
confidence: 99%
“…A further reduction in the work function (by >0.1 eV) is measured when the In 2 O 3 layer is inserted between ITO and ZnO. Since the impact of the In 2 O 3 layer on ITO's work function is minimal (<0.1 eV), the latter observation is attributed to the electron transfer from the conduction band minimum of ZnO to that of In 2 O 3 upon physical contact . The presence of the sharp chemical interface seen in Figure rules out the impact of material intermixing (alloying), hence making electron transfer the most likely process.…”
Section: Work Function Engineering In Bilayer In2o3/zno Etlsmentioning
confidence: 93%
“…Thicker In 2 O 3 layers were found to adversely affect the cell's performance when compared to the reference single‐layer ZnO ETL‐based devices. We attribute this to higher thickness of the In 2 O 3 layer which gives rise to an energetic barrier between the In 2 O 3 and the ZnO …”
Section: Ptb7‐th:pcbm Bulk Heterojunction Solar Cells Base On Bilayermentioning
confidence: 99%