2019
DOI: 10.1515/nanoph-2019-0385
|View full text |Cite
|
Sign up to set email alerts
|

Helium focused ion beam direct milling of plasmonic heptamer-arranged nanohole arrays

Abstract: We fabricate plasmonic heptamer-arranged nanohole (HNH) arrays by helium (He) focused ion beam (HeFIB) milling, which is a resist-free, maskless, direct-write method. The small He+ beam spot size and high milling resolution achieved by the gas field-ionization source used in our HeFIB allows the milling of high aspect ratio (4:1) nanoscale features in metal, such as HNHs incorporating 15 nm walls of high verticality between holes in a 55-nm-thick gold film. Drifts encountered during the HeFIB milling of large … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
20
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
6
2

Relationship

1
7

Authors

Journals

citations
Cited by 33 publications
(25 citation statements)
references
References 25 publications
1
20
0
Order By: Relevance
“…The gold nanoantenna and connectors can be defined via electron beam lithography and lift-off [39]. The small gaps can be machined via helium (He) focused ion beam (HeFIB) milling [40]. The conformal thin insulator layer can be created via atomic layer deposition (ALD) [41].…”
Section: Plasmonic Pixel Designmentioning
confidence: 99%
“…The gold nanoantenna and connectors can be defined via electron beam lithography and lift-off [39]. The small gaps can be machined via helium (He) focused ion beam (HeFIB) milling [40]. The conformal thin insulator layer can be created via atomic layer deposition (ALD) [41].…”
Section: Plasmonic Pixel Designmentioning
confidence: 99%
“…A He + FIB system provides very small milling currents (0.1 nA) and an ultra-narrow beam spot of less than 0.5 nm [ 46 ] with milling resolution of 3.5 nm [ 47 ]. The direct He + FIB milling of an Au film was able to produce high-quality nanostructures, such as plasmonic systems consisting of seven close-packed holes, with a 100 nm diameter and very sharp edges, separated from each other by only 15 nm, [ 48 ] as shown in Figure 1 b. Moreover, in this case, a limited effect of material redeposition from the substrate has been observed.…”
Section: Focused Ion Beam Processingmentioning
confidence: 99%
“…The array consists of seven close-packed holes with 100nm diameter and separated by 15nm of sharp edges without milled material redeposition. Reproduced with permission from [ 48 ]. ( c ) Scheme of the focused ion beam induced deposition (FIBID) procedure: The ions coming from the beam decompose the precursor molecules coming from the gas injection systems leaving a deposit on the substrate.…”
Section: Figurementioning
confidence: 99%
“…Additionally, the heavier ions, most commonly gallium ions, used for creating the nanostructures easily contaminate the sample by implanting the heavy metal and have low resolution compared to EBL [37]. However, with the recent development of technologies, helium ion beams can now be used to create a nanostructured thin film with a resolution of 3.5 nm [49].…”
Section: Pantf By Removal Of Materialsmentioning
confidence: 99%
“…Recently, many other techniques have been developed and improved to create nanohole arrays and are used for various applications. Nevertheless, FIB is still improving and is widely used for preparing nanoholes in varieties of the shape because of its nanometer resolution and template-free nanostructure forming capacity [49].…”
Section: Pantfs With Gapsmentioning
confidence: 99%