Helios: A 15 TW carbon dioxide laser-fusion facility

Carlson, R. R.; Carpenter, J. P.; Casperson, D.; Gibson, R.; Godwin, R. O.; Haglund, Richard F.; Hanlon, J.; Jolly, E.; Stratton, T. F.

doi:10.1109/jqe.1981.1071309

Cited by 29 publications

(8 citation statements)

References 42 publications

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“…The combination of electron beam and plasma technology has been widely investigated for gas-laser applications [26][27][28] and material processings. The combination of electron beam and plasma technology has been widely investigated for gas-laser applications [26][27][28] and material processings.…”

Section: Introductionmentioning

confidence: 99%

Improving the metallic content of focused electron beam-induced deposits by a scanning electron microscope integrated hydrogen-argon microplasma generator

Miyazoe

Utke

Kikuchi

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Articles you may be interested inPolymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25 nm wide magnetic wires J. Vac. Sci. Technol. B 32, 021601 (2014); 10.1116/1.4867753 Modular ultrahigh vacuum-compatible gas-injection system with an adjustable gas flow for focused particle beam-induced deposition Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold Local coinjection of a ͑H 2 -Ar͒ microplasma jet and Cu͑O 2 C 5 F 6 H͒ 2 molecules during focused electron beam-induced deposition ͑FEBID͒ was studied with respect to changes in the Cu:C ratio of deposits. Microplasma-assisted FEBID ͑30 keV and 1 nA͒ decreased codeposition of carbon, oxygen, and fluorine originating from the chamber background and the precursor molecule. The copper metal content could be increased to 41 at. %, being almost four times more than in conventional FEBID deposits without coinjection. Conventional FEB deposits from Cu͑O 2 C 5 F 6 H͒ 2 resulted in 11-12 at. % Cu content. Microplasma post-treatments of conventional FEB deposits resulted in volume changes, surface roughening, and an increase of the overall Cu content to 27 at. %. The removal mechanisms were of nonthermal nature. At repulsive bias potentials from 0 to +30 V, a pure chemical etching of the carbonaceous matrix by atomic hydrogen radials occurred. At attractive bias potentials of up to Ϫ30 V, a more efficient ion induced chemical sputtering regime prevailed where Ar + ions break carbon bonds, which in turn will be passivated by atomic hydrogen radicals to form volatile hydrocarbon compounds.

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Section: Introductionmentioning

confidence: 99%

Improving the metallic content of focused electron beam-induced deposits by a scanning electron microscope integrated hydrogen-argon microplasma generator

Miyazoe

Utke

Kikuchi

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…optical free induction decay, 4,5 optical parametric oscillator, 6 electro-optical switching, 7 and semiconductor switching. 8,9 Although it has been known for some time that the gain bandwidth of multiatmosphere CO 2 lasers was suff icient to allow amplification of picosecond pulses, 9,10 until now the shortest pulse obtained with TW-level power was an ϳ750-ps pulse (FWHM) measured at the laser-fusion facility Helios at the Los Alamos National Laboratory.…”

mentioning

confidence: 99%

“…8,9 Although it has been known for some time that the gain bandwidth of multiatmosphere CO 2 lasers was suff icient to allow amplification of picosecond pulses, 9,10 until now the shortest pulse obtained with TW-level power was an ϳ750-ps pulse (FWHM) measured at the laser-fusion facility Helios at the Los Alamos National Laboratory. 7 To increase energy extraction for a short pulse in this system a multiline scheme in which the laser output was distributed among five rovibrational lines ͑l 10.53 10.61 mm͒ was utilized.…”

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confidence: 99%

“…Final amplification of a 5-MW picosecond pulse occurred in a three-pass large-aperture amplifier. A 20 cm 3 35 cm 3 250 cm electron-beam-sustained amplif ier 7 was used. This amplifier produced a smallsignal gain of 2.9%͞cm on the 10P ͑20͒ line at 2.5 atm.…”

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confidence: 99%

“…For the last two passes, expanding the laser beam to 14 cm in diameter released energy stored in the active medium. It should be noted that we placed a cell with a multiband gas-absorber mix 7 in front of the third-pass mirror to prevent self-oscillation. The output was split and directed to a calorimeter and to a single-shot pulse-length diagnostic.…”

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confidence: 99%

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Generation of 160-ps terawatt-power CO_2 laser pulses

et al. 1999

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We have developed a three-stage CO(2) master-oscillator-amplifier system that produces 1.1 TW of peak power. The system generates 170 J of energy in a diffraction-limited 160+/-10ps pulse on the 10P(20) line. We also report the realization of a two-wavelength terawatt-peak-power CO(2) laser that can be tuned to an arbitrary pair of lines. A two-stage semiconductor switching system driven by a picosecond-pulse Nd:YAG laser was used to slice a short, low-power 10.6-mum pulse for amplification. A simple plasma shutter helped to compensate for gain narrowing in a final three-pass amplifier and to shorten the pulse.

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