Heat Treatment - Conventional and Novel Applications 2012
DOI: 10.5772/50676
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Heat Treatment in Molecular Precursor Method for Fabricating Metal Oxide Thin Films

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Cited by 19 publications
(21 citation statements)
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References 90 publications
(126 reference statements)
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“…The molecular-precursor method (MPM), developed by the authors, represents a simple procedure for thinfilm fabrication of various metal oxides or phosphates [13]. By using the MPM [14,15], an excellent p-type Cu 2 O thin film was first fabricated by heat treating a precursor film containing a dibutylammonium salt of Cu(II) complex with an ethylenediamine-N,N,N 0 ,N 0 -tetraacetic acid (EDTA) ligand under Ar gas flow.…”
Section: Introductionmentioning
confidence: 99%
“…The molecular-precursor method (MPM), developed by the authors, represents a simple procedure for thinfilm fabrication of various metal oxides or phosphates [13]. By using the MPM [14,15], an excellent p-type Cu 2 O thin film was first fabricated by heat treating a precursor film containing a dibutylammonium salt of Cu(II) complex with an ethylenediamine-N,N,N 0 ,N 0 -tetraacetic acid (EDTA) ligand under Ar gas flow.…”
Section: Introductionmentioning
confidence: 99%
“…6 The MPM used to fabricate the active materials is a wet process that can be used to produce thin films of various metal oxides or phosphates, including titania with high photoreactivity, Cu 2 O as a p-type semiconductor, and biocompatible calcium phosphate compounds. [7][8][9] This method is based on the inclusion of metal complexes in coating ‡ …”
mentioning
confidence: 99%
“…6 The MPM used to fabricate the active materials is a wet process that can be used to produce thin films of various metal oxides or phosphates, including titania with high photoreactivity, Cu 2 O as a p-type semiconductor, and biocompatible calcium phosphate compounds. [7][8][9] This method is based on the inclusion of metal complexes in coating solutions, which have many practical advantages, such as excellent stability, homogeneity, miscibility, and coatability. This is because highly stable metal complexes can be dissolved in suitable solvents, such as ethanol, after being combined with appropriate alkylamines.…”
mentioning
confidence: 99%
“…As a result, the MPM represents a facile procedure for thin ilm fabrication of various metal oxides or phosphates, which are useful as electron and/or ion conductors, semiconductors, dielectric materials, etc [24,25]. Figure 1 shows the Co 3 O 4 thin ilms, which were irst fabricated using the molecular precursor solutions.…”
Section: Molecular Precursor Methodsmentioning
confidence: 99%