2021
DOI: 10.1002/aelm.202100556
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Harnessing Phase Transitions in Antiferroelectric ZrO2 Using the Size Effect

Abstract: hysteresis observed in macroscopic polarization-voltage (P-V) measurements in HfO 2 and ZrO 2 thin films is a signature of AFE device functionality and originates from a complex interplay of favorable crystallization conditions. [3,5] Underlying electric field-induced FE structural phase transitions are hypothesized to be responsible for generating the distinctive features of antiferroelectricity in the fluorite material system, yet little is known about how to best exploit such phase transitions in fluorites.… Show more

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Cited by 21 publications
(31 citation statements)
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References 52 publications
(127 reference statements)
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“…However, in ZrO 2 films, the t-phase is the most favorable phase for crystallite sizes up to 34 nm . Therefore, size effects play an important role in the stabilization of the t-phase ,, but have less influence compared to the Si-doping concentration and in-plane stress in the 45 nm thick Si-doped ZrO 2 films investigated here.…”
Section: Resultsmentioning
confidence: 79%
See 1 more Smart Citation
“…However, in ZrO 2 films, the t-phase is the most favorable phase for crystallite sizes up to 34 nm . Therefore, size effects play an important role in the stabilization of the t-phase ,, but have less influence compared to the Si-doping concentration and in-plane stress in the 45 nm thick Si-doped ZrO 2 films investigated here.…”
Section: Resultsmentioning
confidence: 79%
“…According to previous investigations, factors such as biaxial in-plane stress, ,, grain and crystallite size, and doping ,, are hypothesized to influence ferroelectricity in ZrO 2 thin films. However, these factors have been researched independently, and there is still a lack of studies on their interactions.…”
Section: Introductionmentioning
confidence: 99%
“…[26][27][28][29] We note that although this phenomenological model may not capture key experimental features such as domain orientation, grain boundaries, and strain effects in the actual device, the LD model has been employed in previous reports to describe the (A)FE transitions in e.g., PbZrO 3 and ZrO 2 . 39,72,73 According to the phenomenological LD theory, 71,74 the energy difference taken with respect to a non-polar state, DE, can be expressed as a mathematical expansion of the order parameter -for instance, polarization (P) -with:…”
Section: Phenomenological Landau-devonshire Model For Polarization Sw...mentioning
confidence: 99%
“…The wake-up effect in HfO 2 and ZrO 2 -based ferroelectrics is commonly attributed to a fluid, yet irreversible phase transition from the nonpolar tetragonal to the polar orthorhombic phase with electric field cycling [21]. Alternative theories of AFE that could pertain to wake-up include oppositely-imprinted FE domains and ferroelastic switching [22], [23], but the imprint theory is incompatible with piezoresponse force microscopy results showing locally induced phase transitions in AFE ZrO 2 [6]. Since the AFERAM films are cycled at 2.5 V and only the negative voltage branch of the AFE hysteresis loop is switching during cycling, the higher negative electric field stress may cause local defect rearrangement and/or ferroelastic-like mechanisms that stabilize the negative polarization state without influencing the nonpolar to positive polar phase transition.…”
Section: (B)-(c)mentioning
confidence: 99%
“…memories is surging [2]- [4]. In contrast to HfO 2 , which exhibits FE properties sought after for ferroelectric random access memory (FeRAM) applications, polycrystalline ZrO 2 films thinner than 15 nm are typically AFE with a double polarization-voltage (P-V) hysteresis loop [2], [5], [6].…”
mentioning
confidence: 99%