2001
DOI: 10.1088/0953-8984/13/22/111
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Hardness and thermal stability of cubic silicon nitride

Abstract: The hardness and thermal stability of cubic spinel silicon nitride (c-Si3N4), synthesized under high-pressure and high-temperature conditions, have been studied by microindentation measurements, and x-ray powder diffraction and scanning electron microscopy, respectively. The phase at ambient temperature has an average hardness of 35.31 GPa, slightly larger than SiO2 stishovite, which is often referred to as the third hardest material after diamond and cubic boron nitride. The cubic phase is stable up to … Show more

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Cited by 143 publications
(95 citation statements)
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References 17 publications
(14 reference statements)
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“…Later the same modification was synthesized by shock wave [2] and detonation [3] methods. The determined bulk modulus of c-Si 3 N 4 was about 300 GPa and the hardness exceeded 35 GPa [4] which is slightly higher than for SiO 2 -stishovite (about 33 GPa) [5] often referred to as the third hardest material after diamond and cubic boron nitride [4,5].…”
Section: Introductionmentioning
confidence: 82%
“…Later the same modification was synthesized by shock wave [2] and detonation [3] methods. The determined bulk modulus of c-Si 3 N 4 was about 300 GPa and the hardness exceeded 35 GPa [4] which is slightly higher than for SiO 2 -stishovite (about 33 GPa) [5] often referred to as the third hardest material after diamond and cubic boron nitride [4,5].…”
Section: Introductionmentioning
confidence: 82%
“…Thus, it appears that the phase transition is still second order in nature. Because this transition pressure (15 GPa) appears far from the pressure when WB 4 begins to yield (30)(31)(32)(33)(34)(35)(36)(37)(38)(39)(40), the structural change is not likely to be caused by plastic flow; but instead probably results from changes in optimal bonding under pressure within the elastic regime. In ReB 2 , however, a continuous increase of the c/a ratio was found in regardless of the compression conditions within the measured pressure range.…”
Section: Discussionmentioning
confidence: 99%
“…Second, ␥-Si 3 N 4 is a semiconductor with an energy gap of about 3.5 eV 4 -7 and has potential applications in electronics. 8,9 Furthermore, both first-principles calculations and experiments indicate that ␥-Si 3 N 4 has a hardness comparable to the hardest known oxide ͑Stishovite, a high-pressure phase of SiO 2 ), 1,[10][11][12][13] and significantly greater than the hardness of the two well-known hexagonal polymorphs. 14 The ␥-Si 3 N 4 has also a very high resistance in air to oxidation ͑up to 1600 K͒.…”
Section: Introductionmentioning
confidence: 95%