Half-pitch 14nm direct patterning with nanoimprint lithography

Kono, Takuya; Hatano, Masayuki; Tokue, Hiroshi; Katō, Hirokazu; Fukuhara, Kazuya; Nakasugi, Tetsuro

doi:10.1117/12.2514685

Cited by 4 publications

(6 citation statements)

References 3 publications

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“…Repeated use of the stamp accumulates damage in multiple areas as shown in Figure S7b, and the stamp is eventually no longer usable. The recyclability of the stamp is very low compared to NIL, where hundreds of thousands of use repetitions have been demonstrated through long-standing studies by academy and industry . To enhance the recyclability of the stamp, the structure of the stamp should be more rigid, and a precision imprinting tool with vibration isolation is also needed to fine-tune the contact between the anodic stamp and semiconductor substrates.…”

Section: Results and Discussionmentioning

confidence: 99%

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Anodic Imprint Lithography: Direct Imprinting of Single Crystalline GaAs with Anodic Stamp

Kim

Choi

et al. 2019

ACS Nano

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Anodic imprint lithography patterns the GaAs substrate electrochemically by applying a voltage through a predefined anodic stamp. This newly devised technique performs anodic etching in a stamping manner. Stamps that serve as anodic electrodes are fabricated precisely, and the patterns can be imprinted continuously on GaAs substrates. The anodic current locally oxidizes the GaAs through the metal attached to the stamp, and the GaAs oxides are subsequently removed by an acid in the solution. The process is simplified because the metal catalyst is not left on the substrate and the use of an oxidizing agent is not required. Anodic imprint lithography integrates the lithography and etching steps without the use of a polymer resist. Predefined anodic stamps with fin, pillar, and mesh arrays clearly imprinted trenches, holes, and embossed disk arrays on the GaAs substrates, respectively. Anodic imprints replace photons and electrons in conventional lithography with electrochemical stamping, which can simplify existing techniques that are highly complex for extreme nanopatterning.

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Section: Results and Discussionmentioning

confidence: 99%

“…In this background, nanoimprint lithography (NIL) has attracted attention as an alternative lithography technique. − A stamp with predefined patterns imprints a fluidic polymer under UV illumination or thermal treatment. After the NIL process, a mirror symmetrical pattern of the stamp is formed on the imprinted polymer.…”

mentioning

confidence: 99%

Anodic Imprint Lithography: Direct Imprinting of Single Crystalline GaAs with Anodic Stamp

Kim

Choi

et al. 2019

ACS Nano

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“…Moreover, it gives precise control over the energy and dose of the electron beam, as well as accurate registration over small areas on a wafer and lower defect densities [64]. However, the application of EBL is constrained by its slow exposure speed, high cost, and resolution limitations caused by electron beam diffraction in solids [64,74].…”

Section: Electron Beam Lithographymentioning

confidence: 99%

Role of Nanomaterials in the Fabrication of bioNEMS/MEMS for Biomedical Applications and towards Pioneering Food Waste Utilisation

et al. 2022

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bioNEMS/MEMS has emerged as an innovative technology for the miniaturisation of biomedical devices with high precision and rapid processing since its first R&D breakthrough in the 1980s. To date, several organic including food waste derived nanomaterials and inorganic nanomaterials (e.g., carbon nanotubes, graphene, silica, gold, and magnetic nanoparticles) have steered the development of high-throughput and sensitive bioNEMS/MEMS-based biosensors, actuator systems, drug delivery systems and implantable/wearable sensors with desirable biomedical properties. Turning food waste into valuable nanomaterials is potential groundbreaking research in this growing field of bioMEMS/NEMS. This review aspires to communicate recent progress in organic and inorganic nanomaterials based bioNEMS/MEMS for biomedical applications, comprehensively discussing nanomaterials criteria and their prospects as ideal tools for biomedical devices. We discuss clinical applications for diagnostic, monitoring, and therapeutic applications as well as the technological potential for cell manipulation (i.e., sorting, separation, and patterning technology). In addition, current in vitro and in vivo assessments of promising nanomaterials-based biomedical devices will be discussed in this review. Finally, this review also looked at the most recent state-of-the-art knowledge on Internet of Things (IoT) applications such as nanosensors, nanoantennas, nanoprocessors, and nanobattery.

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“…As shown in Figure 2, NIL has several advantages such as high resolution of 1D patterning, high pattern fidelity of 2D patterning, and fine 3D patterning. [1][2] We have developed both, a Jet and Flash Imprint Lithography (J-FIL) and Spin-Coating and Flash Imprint Lithography (SC-FIL) for 2D patterning. [3][4] The performance is shown in Table 1.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of dual damascene structure with nanoimprint lithography and dry-etching

Takeuchi¹,

Hasegawa²,

Toshiaki³

et al. 2023

Novel Patterning Technologies 2023

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Nanoimprint lithography (NIL) has received attention as alternative lithographic technology, which can fabricate fine patterns of semiconductor devices at low cost. Application of NIL may lead to the reduction of number of process steps and cost of manufacturing of dual-damascene structure, by simultaneous fabrication of holes and trenches. Therefore, in this study, we investigated fabrication of dual-damascene structure using NIL and dry-etching. However, the difficulty in dry-etching process is high as the holes and trenches are etched together using single resist mask. Suppression of defects during the NIL process and the suppression of resist consumption and CD shift during the etching process, is critical. To address these issues, we used a high etching resistance resist, optimized the NIL process to reduce defects, and optimized the template structure and etching process to suppress resist consumption and CD shift. As a result, a dual-damascene structure with L/S = 4X/4X nm was obtained.

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Half-pitch 14nm direct patterning with nanoimprint lithography

Cited by 4 publications

References 3 publications

Anodic Imprint Lithography: Direct Imprinting of Single Crystalline GaAs with Anodic Stamp

Anodic Imprint Lithography: Direct Imprinting of Single Crystalline GaAs with Anodic Stamp

Role of Nanomaterials in the Fabrication of bioNEMS/MEMS for Biomedical Applications and towards Pioneering Food Waste Utilisation

Fabrication of dual damascene structure with nanoimprint lithography and dry-etching

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