2012
DOI: 10.1134/s0020168512020173
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Growth of vanadium oxide films on InP under mild conditions and thermal oxidation of the resultant structures

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Cited by 10 publications
(16 citation statements)
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“…5 was due to the fact that the film formed as a result of thermal oxidation does not prevent the evaporation of volatile component. In this case, a correlation with the Auger electron spectroscopy (AES) data [8] was observed, which indicate a very low amount of phosphorus on the surface of the film and in the volume. In samples formed by EEC (for example, no.…”
Section: supporting
confidence: 53%
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“…5 was due to the fact that the film formed as a result of thermal oxidation does not prevent the evaporation of volatile component. In this case, a correlation with the Auger electron spectroscopy (AES) data [8] was observed, which indicate a very low amount of phosphorus on the surface of the film and in the volume. In samples formed by EEC (for example, no.…”
Section: supporting
confidence: 53%
“…The second method consisted of using a vanadium pentoxide gel and precipitation of it from the aerosol phase using a compressor disperser, using a detailed previously-described synthetic procedure is described in the study [8]. The freshly prepared V 2 O 5 gel was precipitated for 3 min onto a cooled InP substrate.…”
Section: Methodsmentioning
confidence: 99%
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“…Magnetron sputtering was performed in a modified UVN 2M system under an oxygen-argon atmosphere, using a vanadium target (99.20% purity; target-substrate distance, 10 cm). V 2 O 5 gel was applied to the InP surface by a technique reported previously [6], through deposition on a cooled substrate over a period of 3 min. To remove chemically bound water and crystallize the chemical stimulator [7], the deposits were annealed in air at 200°C for 60 min in the same furnace as above.…”
Section: Methodsmentioning
confidence: 99%
“…EXPERIMENTAL Vanadium oxide gel was synthesized according to the technique described in [6] with dispersion in a compressor dispersing agent which allows the prepara tion of an aerosol with a solution droplet size of up to 4-5 µm, and subsequent deposition from the aerosol onto InP semiconductor plates cooled using a Peltier element. The deposition time was 3 min.…”
Section: Introductionmentioning
confidence: 99%