Growth of SnO2 thin films by atomic layer deposition and chemical vapour deposition: A comparative study

Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD

“…Several fabrication methods have been employed to grow the epitaxial (single crystal-like) SnO 2 thin films, which include sputtering [11][12][13][14][15][16], chemical vapor deposition (CVD) [17][18][19][20][21][22][23][24], physical vapor deposition (PVD) [25], pulsed laser deposition (PLD) [26][27][28][29][30], an excimer laser-assisted metal organic deposition (ELAMOD) [31], molecular beam epitaxy [32,33], and atomic layer deposition (ALD) [9,[34][35][36][37][38]. The commonly used substrates are sapphire (Al 2 O 3 ) [(0 0 0 1) (c-cut) and (1 1 0 2) (r-cut)] and TiO 2 [(0 0 1), (1 1 0), (1 0 0), and (1 1 1)], and in-and out-of-plane epitaxial relationships between SnO 2 films and substrates have been reported.…”

Plasma-assisted molecular beam epitaxy of SnO2 on TiO2

“…A highly sensitive surface also makes SnO 2 an important material for sensor technology [6][7][8]. Currently, the methods of reactive radio frequency magnetron sputtering [9], sol-gel synthesis, chemical vapor deposition (CVD) [10,11] and atomic layer deposition (ALD) [11][12][13] are commonly used to produce SnO 2 thin films for various studies. Unfortunately, extensive investigations of SnO 2 fundamental material properties are currently limited by poorly controlled impurity levels in the films.…”

Annealing Effects on the Metal and Semiconductor Nanowires Loaded Inside the Alumina Pores

“…Besides, tin-based oxides are promising candidates to replace the carbonbased anode materials because of their large capacity for lithium insertion by the formation of Li 4.4 Sn alloy (Wang et al 2005). During the recent decade SnO 2 nanotubes (Qin et al 2008), nanoparticles and nanorods (Firooz et al 2008), and nanobelts (Fujihara et al 2004) have been fabricated by different methods such as sol-gel process (Gu et al 2003), hydrothermal synthesis (Firooz et al 2008;Fujihara et al 2004), chemical vapour deposition (CVD) (Kong et al 2003;Sundqvist et al 2006), metalorganic chemical vapour deposition (MOCVD) (Feng et al 2008), and etching of tin foils in alkaline solution (Peng et al 2008). Despite these proposals there is a great need to develop reliable and cheap synthesis www.intechopen.com methods for fabrication of densely-packed, uniform-shaped tin oxide nanowire arrays for practical applications.…”