Growth of single crystal ZnO nanowires using sputter deposition

Chiou, Wen Ting; Wu, Wan Yu; Ting, Jyh Ming

doi:10.1016/s0925-9635(03)00274-7

Cited by 224 publications

(106 citation statements)

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“…It has been demonstrated to have enormous applications in electronic, optoelectronic, electrochemical, and electromechanical devices [3][4][5][6][7][8], such as ultraviolet (UV) lasers [9,10], light-emitting diodes [11], field emission devices [12][13][14], high performance nanosensors [15][16][17], solar cells [18][19][20][21], piezoelectric nanogenerators [22][23][24], and nanopiezotronics [25][26][27]. One-dimensional (1D) ZnO nanostructures have been synthesized by a wide range of techniques, such as wet chemical methods [28][29][30], physical vapor deposition [31][32][33], metal-organic chemical vapor deposition (MOCVD) [34][35][36], molecular beam epitaxy (MBE) [37], pulsed laser deposition [38,39], sputtering [40], flux methods [41], eletrospinning [42][43][44], and even top-down approaches by etching [45]. Among those techniques, physical vapor deposition and flux methods usually require high temperature, and easily incorporate catalysts or impurities into the...…”

Section: Introductionmentioning

confidence: 99%

One-dimensional ZnO nanostructures: Solution growth and functional properties

2011

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One-dimensional (1D) ZnO nanostructures have been studied intensively and extensively over the last decade not only for their remarkable chemical and physical properties, but also for their current and future diverse technological applications. This article gives a comprehensive overview of the progress that has been made within the context of 1D ZnO nanostructures synthesized via wet chemical methods. We will cover the synthetic methodologies and corresponding growth mechanisms, different structures, doping and alloying, positioncontrolled growth on substrates, and finally, their functional properties as catalysts, hydrophobic surfaces, sensors, and in nanoelectronic, optical, optoelectronic, and energy harvesting devices.

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Section: Introductionmentioning

confidence: 99%

One-dimensional ZnO nanostructures: Solution growth and functional properties

2011

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“…It is also being considered as a potential candidate in the new frontiers of research like spintronics [7]. Various chemical and physical processes have been employed for thin film deposition, such as conventional sputter deposition technique [8], chemical vapor deposition (CVD) [9,10], thermal evaporation [11,12], spray pyrolysis [13,14], and electro deposition [15]. Like chemical bath deposition technique, the Successive Ionic Layer Adsorption and Reaction (SILAR) technique for the preparation of thin films from aqueous solution is a promising technique because of its simplicity and economics.…”

Section: Introductionmentioning

confidence: 99%

Optical and Structural Properties of ZnO Thin Films Fabricated by SILAR Method

Sarma¹,

Chakrabortty²,

Sarma³

2014

IJIRSET

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ABSTRACT:A novel and simple chemical route was used for the deposition of ZnO thin film from aqueous solution of zinc-ammonia complex, integrating the merits of successive ionic layer adsorption and reaction (SILAR) and chemical bath deposition methods. ZnO thin films on glass substrates were deposited with the precursor of zincammonia complex. Characterization techniques of XRD, SEM, EDAX and DRS are used to characterize ZnO thin films. X-ray diffraction study show that the film prepared in this work exhibits good crystallinity with the hexagonal wurtzite crystalline structure and the preferential orientation along (0 0 2) plane, with a texture coefficient value of ~2.56, average crystallite size of 28.92 nm and with lattice constants a = b = 3.257 Å, c = 5.215 Å. EDAX spectrum indicates that the film consists of zinc and oxygen elements. The optical band gap energy of the thin films is calculated from optical absorption spectrometry using DRS data and the value was found to be direct allowed transition ~3.22 eV.

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“…From an experimental point of view, many methods have been employed for the growth of ZnO nanomaterials with different compositions and morphologies, such as vapor-phase transport processes [19][20][21], chemical vapor deposition (CVD) [22], metalorganic chemical vapor deposition (MOCVD) [23,24], molecular beam epitaxy (MBE) [25], pulsed laser deposition (PLD) [26], sputtering [27], and template-based method [28]. In particular, soft solution processes and wet chemical methods, such as electrodeposition technique [29,30] and aqueous chemical growth [31,32], provide the possibility of growing ZnO nanostructures at low temperature.…”

Section: Zno Synthesis Techniquesmentioning

confidence: 99%

“…The deposition from Zn target is generally more favorable to the growth of porous ZnO films [73], and even nanowires formation [76] can occur with this method, although only particular system configurations (such as unbalanced sputtering systems) and conditions (especially oxygen partial pressure and RF power) have to be adopted. Moreover, other methods are more suitable for the synthesis of nanostructured ZnO since they can lead to highly ordered ZnO structures with a better control of the morphology.…”

Section: Sputter Depositionmentioning

confidence: 99%