Growth of single crystal, oriented SnO₂nanocolumn arrays by aerosol chemical vapour deposition

Abstract

A single-step, template-free aerosol chemical vapor deposition (ACVD) method is demonstrated to grow well-aligned SnO 2 nanocolumn arrays. The ACVD system parameters, which control thin film morphologies, were systematically explored to gain a qualitative understanding of nanocolumn growth mechanisms. Key growth variables include feed rates, substrate temperature, and deposition time. System dynamics relating synthesis variables to aerosol characteristics and processes (collision and sintering) are elucidated. By adjusting system parameters, control of the aspect ratio, height, and crystal structure of columns is demonstrated. A self-catalyzed (SnO 2 particles) vapor-solid (VS) growth mechanism, whereby a vapor-particle deposition regime results in the formation of nanocrystals that act as nucleation sites for the preferential formation and growth of nanocolumns, is proposed and supported. Density functional theory (DFT) calculations indicate that the preferential orientation of thin films is a function of the system redox conditions, further supporting the proposed VS growth mechanism. When taken together, these results provide quantitative insight into the growth mechanismIJs) of SnO 2 nanocolumn thin films via ACVD, which is critical for engineering these, and other, nanostructured films for direct incorporation into functional devices.

BornAgain: software for simulating and fitting grazing-incidence small-angle scattering

“…They involve films of water (Gutfreund et al, 2016), alkane (Fontaine et al, 2018), lipid (Nylander et al, 2017), organic semiconductor (Zykov et al, 2017) and inorganic semiconductor (Highland et al, 2017;Singh et al, 2017); microgels (Kyrey et al, 2018) and microemulsions ; templated (Li-Destri et al, 2016) and self-assembled polymer structures (Berezkin et al, 2018;Glavic et al, 2018;Xie et al, 2018); nanocolumns growing from vapor deposition (Haddad et al, 2016); Au nanoparticles during CO oxidation (Odarchenko et al, 2018); C 60 monolayer islands (Kowarik, 2017); magnetic nanoparticles (Ukleev et al, 2016(Ukleev et al, , 2017 and magnetic films (Merkel et al, 2015;Glavic et al, 2018); lithographic gratings (Pflü ger et al, 2019); and sputtered multilayers . They involve films of water (Gutfreund et al, 2016), alkane (Fontaine et al, 2018), lipid (Nylander et al, 2017), organic semiconductor (Zykov et al, 2017) and inorganic semiconductor (Highland et al, 2017;Singh et al, 2017); microgels (Kyrey et al, 2018) and microemulsions ; templated (Li-Destri et al, 2016) and self-assembled polymer structures (Berezkin et al, 2018;Glavic et al, 2018;Xie et al, 2018); nanocolumns growing from vapor deposition (Haddad et al, 2016); Au nanoparticles during CO oxidation (Odarchenko et al, 2018); C 60 monolayer islands (Kowarik, 2017); magnetic nanoparticles (Ukleev et al, 2016(Ukleev et al, , 2017 and magnetic films (Merkel et al, 2015;…”

Oriented, One‐Dimensional Tin Dioxide–Titanium Dioxide Composites as Anode Materials for Lithium‐Ion Batteries

“…Strong( 110), (101), and (211) peaks are present, with the (101) and (211) peaks becoming more prevalent with increased deposition time.T his trend is consistent with previous observations from the ACVD process and suggests that energetically favored deposition planes exist, which would be consistent with the suggested growth mechanism in the reactor. [20] High-resolution transmission electron microscopy (HR-TEM)w as used to measure the diametero ft he columns as 92 AE 7nm, which was not noticeably affected by depositiontime and can be seen in Figure 1f.T he single crystallinen ature of the columns is further supported by HR-TEM,a nd can be seen by the selected area electron (SAED) pattern in the inset of Figure 1f.…”

Metal Oxide Nanostructures in Food Applications: Quality Control and Packaging

“…The vapor phase deposition method is mainly performed at elevated temperatures under the gas flow in a chamber [23,25]. Great efforts have been made for the fabrication of one dimensional (1D) and thin film metal oxide nanostructures using the chemical vapor deposition (CVD) method, which involves the formation of nanomaterials onto the substrate by the chemical reactions of vapor phase precursors [5,[26][27][28]. In this case, the reactions can be enhanced by higher frequency radiation and plasma [26,29,30].…”