“…If it is too low, the negative space charge caused by the electrons flowing from the cathode to the anode may cause a strong increase of the electric-field strength near the n − -n junction formed by the n − -base region and the n-FS region. Extensive investigations [29][30][31][32][33] have shown that the uniform current-density distribution under such conditions can be destabilised by the appearance of single or multiple current filaments. Furthermore, recent device simulations [33] have shown that destabilisation of the uniform current-density distribution may be triggered even in the absence of impact ionisation in the anodeside high-field region.…”
Section: Increased Short-circuit Robustness By the Concept Of Injectimentioning
Recent progress in insulated gate bipolar transistor (IGBT) development is reviewed. Highlighted issues range from technological aspects such as special processes suitable for thin-wafer-processing, through the advanced cell and vertical concepts to approaches for improved IGBT ruggedness. Latest advancements regarding thermal management in both modules and discrete chips are also addressed. (a) Turn-off transients of a 15 A-1200 V-IGBT with an FS layer created by a threestage proton implantation (T = 125°C), (b) Maximum DC-link voltage V DC,max at which the IGBT can be turned off softly
“…If it is too low, the negative space charge caused by the electrons flowing from the cathode to the anode may cause a strong increase of the electric-field strength near the n − -n junction formed by the n − -base region and the n-FS region. Extensive investigations [29][30][31][32][33] have shown that the uniform current-density distribution under such conditions can be destabilised by the appearance of single or multiple current filaments. Furthermore, recent device simulations [33] have shown that destabilisation of the uniform current-density distribution may be triggered even in the absence of impact ionisation in the anodeside high-field region.…”
Section: Increased Short-circuit Robustness By the Concept Of Injectimentioning
Recent progress in insulated gate bipolar transistor (IGBT) development is reviewed. Highlighted issues range from technological aspects such as special processes suitable for thin-wafer-processing, through the advanced cell and vertical concepts to approaches for improved IGBT ruggedness. Latest advancements regarding thermal management in both modules and discrete chips are also addressed. (a) Turn-off transients of a 15 A-1200 V-IGBT with an FS layer created by a threestage proton implantation (T = 125°C), (b) Maximum DC-link voltage V DC,max at which the IGBT can be turned off softly
“…One of the superior features of IGBTs is the ability to withstand both a high voltage and high current under short-circuit (SC) conditions for a certain time interval. The short-circuit safe operating area (SC-SOA) limit was investigated by many authors for IGBTs of different voltage classes from 1200 V to 6500 V [1][2][3][4][5][6]. The results in ref.…”
In this work the improved short-circuit robustness of a new IGBT along with its switching behavior is investigated. The application of the recently proposed injection enhanced floating emitter (IEFE) concept to a 6.5 kV IGBT results in a higher hole current injection from the buried floating p-islands in front of the p-collector under short-circuit conditions. Hence, this concept provides a significantly improved short-circuit robustness compared to IGBT without p-islands and for the same design. The simulated results of the IEFE IGBTs depict the suppression of electrical current crowding at the collector-side without affecting the static and dynamic losses of the device.
“…The short-circuit safe operating area (SC-SOA) for different voltage classes ranging from 1200 V to 6500 V has been investigated in [1][2][3][4][5][6]. The results shown in [6], explain that IGBT SC destruction can be due to the formation of current filaments occurring at the collector side.…”
In this work, an investigation of the top-side aluminium (Al) metallization modification, under repetitive short-circuit (SC) type I measurements, was carried out for 650 V IGBTs. These measurements were performed far beyond the safe operating area (SOA). The presence of current density filaments at the collector side during SC leads to a local temperature increase that reconstructs the emitter metallization and thus leads to a modification of the top Al surface. Here, the optical microscope was used to observe the change in emitter surface metallization. For 650 V IGBTs, a uniform Al modification pattern was observed irrespective of DC-link voltage and SC pulse width, which is in contrast to the results of 1200 V and 1700 V IGBTs. The computer-aided TCAD simulations were performed using a simplified front-side IGBT structure to understand the uniform Al modification on all the measured DC-link voltages.
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