2006
DOI: 10.1016/j.vacuum.2005.12.002
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Growth of La0.7Sr0.3MnO3 films on Si(001) using SrMnO3 template layer

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Cited by 5 publications
(4 citation statements)
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“…There is a dilemma that a higher temperature is better for crystal growth from the viewpoint of thermodynamics, but an intermediate temperature is necessary to achieve p-type conductivity in SnO 2 films [3], and the incorporation of a buffer layer between the main film and the substrate may be a simple and feasible approach to solve the problem. And the highly oriented films growth by incorporating a homo-or hetero-seed (or buffer) layer between the film and the substrate has been achieved in many other oxides, such as ferroelectric and colossal magnetoresistance films [15,17,18]. The underlying mechanism of the seed layer affecting the preferential orientation of the oxide films have been well demonstrated by Schwartz et al [19,20].…”
Section: Resultsmentioning
confidence: 96%
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“…There is a dilemma that a higher temperature is better for crystal growth from the viewpoint of thermodynamics, but an intermediate temperature is necessary to achieve p-type conductivity in SnO 2 films [3], and the incorporation of a buffer layer between the main film and the substrate may be a simple and feasible approach to solve the problem. And the highly oriented films growth by incorporating a homo-or hetero-seed (or buffer) layer between the film and the substrate has been achieved in many other oxides, such as ferroelectric and colossal magnetoresistance films [15,17,18]. The underlying mechanism of the seed layer affecting the preferential orientation of the oxide films have been well demonstrated by Schwartz et al [19,20].…”
Section: Resultsmentioning
confidence: 96%
“…This phenomenon has also been proved quantitatively by the texture coefficient, as shown in figure 1(b). The thickness-dependent preferential orientation has been observed in SnO 2 films grown by atmospheric pressure chemical vapour deposition [13] and in many other oxide and nitride films prepared by magnetron sputtering [15,16]. The underlying mechanism that determines the preferential orientation of SnO 2 : N film contains energy minimization of thermodynamics and selective evolution of dynamics and correlates with surface energy, strain energy and interface energy between the film and the substrate.…”
Section: Resultsmentioning
confidence: 99%
“…LSMO-ZnO heterostructure has 6.78% PCE, where LSMO-STO has only 0.47% PCE. This indicates enhanced separation and collection of photo-generated charge carriers in LSMO-ZnO [16][17][18]. It also shows that short-circuit current in LSMO-ZnO is ∼10% higher than LSMO-STO.…”
Section: Numerical Simulationsmentioning
confidence: 84%
“…It shows that lattice mismatch between LSMO and ZnO is higher as compared with LSMO and STO, so a rough layer of LSMO will be grown over ZnO [16][17][18][19]. It can develop epitaxial…”
Section: Lattice Mismatchmentioning
confidence: 99%