Angle-dependent photoluminescence of [1 1 0]-oriented nitrogen-doped SnO₂films

Abstract

The orientation growth and angle-dependent photoluminescence (PL) of nitrogen-doped SnO 2 films grown on Si substrate by reactive magnetron sputtering have been studied. It was found that the orientation of the nitrogen-doped SnO 2 films depends strongly on their thickness, and a highly [1 1 0]-oriented film was achieved with a seed layer. An angle-dependent PL of the [1 1 0]-oriented films was observed, and the PL peak position shifts towards the longer wavelength side and the PL peak width decreases as the observation angle decreases. This angle-dependent PL was attributed to the Fabry-Pérot optical interference effect.

Broadband and omnidirectional light harvesting enhancement of fluorescent SiC

“…3(a), it is seen that the luminescence intensity of the bare SiC decreases together with a blue shift of the peak wavelength as the emission angle increases from 20 to 70 deg., which could be attributed to the Fabry-Pérot microcavity interference effect explained in the Ref. [7,18,19]. In Fig.…”

Three- and Two-Photon NIR-to-Vis (Yb,Er) Upconversion from ALD/MLD-Fabricated Molecular Hybrid Thin Films

“…Because of the finite thickness of thin films, they will show an excitation angle dependence of emission intensity because of effects such as excitation photon density and penetration depth that have no influence in bulk luminescent materials. Angular dependencies for thin film luminescence have been presented in refs − and typically the intensity varies with angle, but there is still emission from all angles. However, for our film, the upconversion emission is obtained only with incident angles between ca.…”

An economic CVD technique for pure SnO 2 thin films deposition: Temperature effects

“…While SnO 2 (TO) films have been produced by a variety of techniques including sputtering, evaporation, spray pyrolysis and others (Smith 2000;Sankapal et al 2000;Singha et al 2004;Horvath et al 2005;Fang and Chang 2005;Sahay and Nath 2007;Chako et al 2007;Pan et al 2007;Rozati and Akeste 2008;Ikhmayies and Ahmad-Bitar 2008;Paraguay-Delgado et al 2008). Little work appears to have been done with air pressure chemical vapour deposition (APCVD) technique (Advani et al 1979;Tarey and Raju 1985;Vlahovic and Persin 1990;Sheel et al 2009;Dagkaldiran et al 2009).…”