2013
DOI: 10.1016/j.ssc.2012.12.026
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Growth of highly (110)- and (111)-textured SrTiO3 thin films on Pt(111)/α-Al2O3(0001) substrates by ECR ion beam sputter deposition

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Cited by 6 publications
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“…Various methods had been developed to prepare STO film such as radio frequency sputtering, spray inductively coupled plasma technique, pulsed laser deposition, molecular beam epitaxy, sol‐gel, electron cyclotron resonance ion beam sputter deposition, metal‐organic chemical vapor deposition (MOCVD), and laser chemical vapor deposition (laser CVD) . Among these techniques, the laser CVD was considered as a more promising approach due to its high deposition rate ( R dep ) and excellent control of film orientation .…”
Section: Introductionmentioning
confidence: 99%
“…Various methods had been developed to prepare STO film such as radio frequency sputtering, spray inductively coupled plasma technique, pulsed laser deposition, molecular beam epitaxy, sol‐gel, electron cyclotron resonance ion beam sputter deposition, metal‐organic chemical vapor deposition (MOCVD), and laser chemical vapor deposition (laser CVD) . Among these techniques, the laser CVD was considered as a more promising approach due to its high deposition rate ( R dep ) and excellent control of film orientation .…”
Section: Introductionmentioning
confidence: 99%