2009
DOI: 10.1002/pssc.200880925
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Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD

Abstract: An AlGaN based high electron mobility transistor (HEMT) structure was grown on 200 mm diameter (111) silicon by metal organic chemical vapour deposition (MOCVD). The growth was initiated by an AlN layer directly on Si. A level wafer temperature profile (±5 °C) was achieved throughout the process by use of a variable concentric heater profile. This was realised by monitoring the wafer temperature profile of the entire wafer in‐situ using pyrometry. Excellent uniformity, σ ∼ 1%, of each component layer was achie… Show more

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Cited by 63 publications
(36 citation statements)
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“…Recently, remarkable results have been obtained on silicon substrate [4]- [6]. Silicon substrates offer an interesting alternative to silicon carbide through their low cost and their large area availability [7]. One advantage of using silicon as a substrate is the possibility of cointegrating GaN-HEMTs with CMOS main frame technology [8].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Recently, remarkable results have been obtained on silicon substrate [4]- [6]. Silicon substrates offer an interesting alternative to silicon carbide through their low cost and their large area availability [7]. One advantage of using silicon as a substrate is the possibility of cointegrating GaN-HEMTs with CMOS main frame technology [8].…”
Section: Introductionmentioning
confidence: 99%
“…Si wafer [17]. Even though it is not as advanced compared with MOCVD [7], MBE developments on larger size silicon substrate are under progress [18].…”
Section: Introductionmentioning
confidence: 99%
“…However, to date, there has been less success in achieving high quality AlGaN/GaN heterostructure on 200 mm Si substrates due to issues like epilayer cracking, wafer bowing, and high density of point and line defects when nitride stack thickness exceeds 3.0 lm. To showcase high electron mobility transistors (HEMTs) on 200 mm Si platform with comparatively similar device performances levels as reported currently on Si substrate platform, 7,8 it is necessary to grow thicker GaN buffer to minimize the buffer leakage and also to improve the layer crystalline quality.…”
mentioning
confidence: 97%
“…It should be noted that the silicon is oriented (111) rather than the standard (100) in order to have trigonal symmetry, which better matches the hexagonal symmetry of GaN. With silicon substrates easily available in 150 mm and 200 mm diameters and GaN on 200 mm silicon substrate growth capabilities as early as 2009, 25 this approach allows integration using standard electronics processing lines. This has the potential to reduce costs for industrialization of GaN based power devices as a product and allows large-scale, high-quality production to be achieved more easily (see the article by Semond in this issue).…”
Section: The Materials Challengementioning
confidence: 99%