2008
DOI: 10.1016/j.physc.2008.05.151
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Growth of bi-axially textured Bi2Sr2Ca1Cu2O8+δ (2212) thin films on SrTiO3 substrate by sputtering method

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Cited by 9 publications
(6 citation statements)
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“…Several techniques for producing the thin films have been investigated in various laboratories to advance the qualities of thin films for devices. The parameters of the device can be controlled by the preparation techniques, some of which involving the molecular beam epitaxy (MBE) [7,8], dc sputtering [9], rf sputtering [10], chemical vapor deposition (CVD) [11,12] and pulsed laser deposition (PLD) techniques [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…Several techniques for producing the thin films have been investigated in various laboratories to advance the qualities of thin films for devices. The parameters of the device can be controlled by the preparation techniques, some of which involving the molecular beam epitaxy (MBE) [7,8], dc sputtering [9], rf sputtering [10], chemical vapor deposition (CVD) [11,12] and pulsed laser deposition (PLD) techniques [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…Since Bi-2212 is more stable than Bi-2223, which can only be obtained within a very narrow temperature window [30][31][32], it is easy to produce Bi-2212 phase in thin film form. The thin films of the Bi-2212 phase can be synthesized with various methods , such as molecular beam epitaxy (MBE) [33,34], DC sputtering [35], RF sputtering [36], chemical vapor deposition (CVD) [37,38], and pulsed laser deposition (PLD) techniques [2,3,9,13].…”
Section: Introductionmentioning
confidence: 99%
“…However, the critical current density (J c ) of BSCCO multifilamentary superconducting wires by PIT is lower than Y 1 Ba 2 Cu 3 O x (YBCO) coated conductors. This is because the in-plane crystal grains in the BSCCO system act as weak links for current transport [2][3][4][5]. To improve the J c of a BSCCO system, it is necessary to reduce the number of grain boundaries.…”
Section: Introductionmentioning
confidence: 99%