1996
DOI: 10.1016/0927-0248(95)00141-7
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Growth of a-Si:H on transparent conductive oxides for solar cell applications

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Cited by 19 publications
(7 citation statements)
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“…The H 2 /Ar annealing conditions (no plasma) were 1 atmosphere of forming gas (2% H 2 ) at 200, 300, and 400°C for 30 minutes. Some samples were also annealed in 1 atmosphere of air or Ar at 300°C for 30…”
Section: Experimental Techniquesmentioning
confidence: 99%
See 1 more Smart Citation
“…The H 2 /Ar annealing conditions (no plasma) were 1 atmosphere of forming gas (2% H 2 ) at 200, 300, and 400°C for 30 minutes. Some samples were also annealed in 1 atmosphere of air or Ar at 300°C for 30…”
Section: Experimental Techniquesmentioning
confidence: 99%
“…It has been reported that degradation can be minimized or even eliminated by using low substrate temperatures [29,30], faster a-Si growth rates [30], or by covering the SnO 2 with a thin protective layer of sputtered ZnO [30,31,32]. The ZnO properties are relatively inert to reduction in H 2 plasma [29,30] although the H 2 penetrates several hundred Angstroms into the ZnO [30,33,34] and increases its bandgap [33,35]. However, there are conflicting reports saying that ZnO is also reduced by the plasma [35] or that it fails to protect the underlying SnO 2 layer [36,37].…”
Section: Introductionmentioning
confidence: 99%
“…The deposition of this material is well known due to its use in Low E coatings. However, it is susceptible to degradation from the hydrogen plasma used in the production of amorphous silicon and tandem silicon cells [8]. This in turn leads to reduced cell efficiency due to the poorer interface between the FTO and the silicon absorber, along with much reduced light transmission [9].…”
Section: Introductionmentioning
confidence: 99%
“…The SnO 2 is chemically reduced, leaving a thin but highly absorbing Sn-rich layer [12,13,14]. It has been reported that degradation can be minimized or even eliminated by using low substrate temperatures [14,15], at faster a-Si growth rates [15], or by covering the SnO 2 with a thin protective sputtered ZnO:Al layer [16,17,18]. The ZnO properties are relatively inert to H 2 plasma damage [14,15] although the H 2 penetrates several hundred Angstroms into the ZnO [15,19] and increases its bandgap (8).…”
Section: Effect Of H 2 Plasma and C-si Deposition On Sno 2 And Zno/snmentioning
confidence: 99%