Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn<sub>2</sub>O<sub>4</sub> Thin Films on Au/Polyimide Flexible Substrates

Abstract

LiMn 2 O 4 thin films are deposited on gold coated polyimide flexible substrates using RF magnetron sputtering technique maintained at a moderate substrate temperature of 300˚C. The films exhibited characteristic peaks with predominant (111) orientation representing cubic spinel structure of Fd3m symmetry with an evaluated lattice parameter of 8.199 Å. The surface topography of films exhibited pyramidal shaped grains oriented vertical to the substrate surface with root mean square surface roughness of 90 nm. The Pt/LiMn 2 O 4 electrochemical cell in aqueous region exhibited two step de-insertion and insertion kinetics of Li ion during oxidation and reduction reaction with an initial discharge capacity of 36 μAh•cm −2 •μm −1 .

Microstructural and Electrochemical Properties of rf-Sputtered LiFeO2Thin Films

“…To best of our knowledge, no efforts were made to grow thin films of LiFeO 2 . Among various physical and chemical vapor deposition techniques, rf-magnetron sputtering technique is found to be a powerful and best technique for the deposition of metal oxide thin films with reasonable stoichiometry, crystallinity, and morphology by properly controlling the essential deposition parameters [16]. The electrochemical properties of the bulk/film electrodes of different cathode materials were studied to understand the Li + kinetics in the host material by several authors employing nonaqueous electrolytes.…”

Some Properties of Manganese Oxide (Mn-O) and Lithium Manganese Oxide (Li-Mn-O) Thin Films Prepared via Metal Organic Chemical Vapor Deposition (MOCVD) Technique

“…Various methods of preparing Mn-O and LiMn-O thin film systems have been reported [18][19][20][21]. The use of MOCVD (Metal organic chemical vapor deposition) has become one of the most important technique for preparing thin films and coatings of large variety of materials essential to micro electronics fabrication where some of the most sophisticated conditions must be met.…”