Growth mechanism of single-crystalline NiO thin films grown by metal organic chemical vapor deposition

Roffi, Teuku Muhammad; Nozaki, Satoshi; Uchida, Kazuo

doi:10.1016/j.jcrysgro.2016.06.047

Cited by 30 publications

(13 citation statements)

References 24 publications

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“…In this regard, metal oxide nanomaterials such as NiO nano-disks have shown a promising potential for dye adsorption and photodecomposition. This metal oxide as doped and undoped has been synthesized via different techniques such as sol-gel [156], metal organic chemical vapor deposition [157], precipitation [158], solvothermal route [159], and a hydrothermal method [160]. The latter technique has been used for synthesis of NiO nano-disks (5-20 nm) as the photocatalysts that can photodegrade MB dye under visible light (98.7% in 20 min).…”

Section: D Inorganic Nano-adsorbentsmentioning

confidence: 99%

The Nanosized Dye Adsorbents for Water Treatment

Homaeigohar

2020

Nanomaterials

138

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Clean water is a vital element for survival of any living creature and, thus, crucially important to achieve largely and economically for any nation worldwide. However, the astonishingly fast trend of industrialization and population growth and the arisen extensive water pollutions have challenged access to clean water across the world. In this regard, 1.6 million tons of dyes are annually consumed. Thereof, 10%–15% are wasted during use. To decolorize water streams, there is an urgent need for the advanced remediation approaches involving utilization of novel materials and technologies, which are cost and energy efficient. Nanomaterials, with their outstanding physicochemical properties, can potentially resolve the challenge of need to water treatment in a less energy demanding manner. In this review, a variety of the most recent (from 2015 onwards) opportunities arisen from nanomaterials in different dimensionalities, performances, and compositions for water decolorization is introduced and discussed. The state-of-the-art research studies are presented in a classified manner, particularly based on structural dimensionality, to better illustrate the current status of adsorption-based water decolorization using nanomaterials. Considering the introduction of many newly developed nano-adsorbents and their classification based on the dimensionality factor, which has never been employed for this sake in the related literature, a comprehensive review will be presented.

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Section: D Inorganic Nano-adsorbentsmentioning

confidence: 99%

The Nanosized Dye Adsorbents for Water Treatment

Homaeigohar

2020

Nanomaterials

138

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“…The effect of film stress on the resistivity of NiO x thin films was reported by Roffi et al who deposited epitaxial films on (001) Al 2 O 3 , and (100) and (111) MgO substrates at 300°C to 600°C at atmospheric pressure using NiCpAllyl and O 2. 58 They observed that the stress in the films results in cation vacancies to accommodate for the lattice mismatch. Hence, with compressive stress the improved crystallinity by the higher deposition temperature leads to more nickel vacancies, which creates more carriers and decreases the resistivity, while with tensile stress the improved crystallinity is achieved with fewer vacancies and carriers, and the resistivity increases 58 .…”

Section: Chemical Deposition Of Nickel Oxide Thin Filmsmentioning

confidence: 99%

“… 58 They observed that the stress in the films results in cation vacancies to accommodate for the lattice mismatch. Hence, with compressive stress the improved crystallinity by the higher deposition temperature leads to more nickel vacancies, which creates more carriers and decreases the resistivity, while with tensile stress the improved crystallinity is achieved with fewer vacancies and carriers, and the resistivity increases 58 . They also investigated the effect of the flow ratios of O 2 and nickel precursor, and showed that the increase in O 2 flow decreases the resistivity by an order of magnitude from 2700 to 250 Ω cm, which they attribute to the improved crystallinity.…”

Section: Chemical Deposition Of Nickel Oxide Thin Filmsmentioning

confidence: 99%

“…They also investigated the effect of the flow ratios of O 2 and nickel precursor, and showed that the increase in O 2 flow decreases the resistivity by an order of magnitude from 2700 to 250 Ω cm, which they attribute to the improved crystallinity. However, the effect of the O 2 flow rates on the film stoichiometry cannot be excluded as the film composition was not measured 58 . The importance of the substrate and NiO x film stress is highlighted also by Lo Nigro et al who used CVD grown epitaxial NiO x thin films as dielectrics in wide band gap semiconductor AlGaN/GaN devices 54,55 .…”

Section: Chemical Deposition Of Nickel Oxide Thin Filmsmentioning

confidence: 99%

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Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Napari

Huq

Hoye

et al. 2020

InfoMat

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Nickel oxide (NiOx), a p‐type oxide semiconductor, has gained significant attention due to its versatile and tunable properties. It has become one of the critical materials in wide range of electronics applications, including resistive switching random access memory devices and highly sensitive and selective sensor applications. In addition, the wide band gap and high work function, coupled with the low electron affinity, have made NiOx widely used in emerging optoelectronics and p‐n heterojunctions. The properties of NiOx thin films depend strongly on the deposition method and conditions. Efficient implementation of NiOx in next‐generation devices will require controllable growth and processing methods that can tailor the morphological and electronic properties of the material, but which are also compatible with flexible substrates. In this review, we link together the fundamental properties of NiOx with the chemical processing methods that have been developed to grow the material as thin films, and with its application in electronic devices. We focus solely on thin films, rather than NiOx incorporated with one‐dimensional or two‐dimensional materials. This review starts by discussing how the p‐type nature of NiOx arises and how its stoichiometry affects its electronic and magnetic properties. We discuss the chemical deposition techniques for growing NiOx thin films, including chemical vapor deposition, atomic layer deposition, and a selection of solution processing approaches, and present examples of recent progress made in the implementation of NiOx thin films in devices, both on rigid and flexible substrates. Furthermore, we discuss the remaining challenges and limitations in the deposition of device‐quality NiOx thin films with chemical growth methods.

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“…Numerous techniques have been employed for the preparation of good quality NiO thin films. These include chemical bath deposition [8,9], SILAR [10], sol-gel dip coating [11], potentiostatic electrodeposition [12], spin coating [13], electro-hydrodynamic atomization (EHDA) [14], spray pyrolysis [7,[15][16][17], e-beam evaporation [18], radio frequency magnetron sputtering [19], metal organic chemical vapor deposition (MOCVD) [20].…”

Section: Introductionmentioning

confidence: 99%

Study of Physical Properties of Nanocrystalline NiO Thin Films Prepared by Spray Pyrolysis Technique

.¹,

Wagh²,

Ahirrao³

et al. 2019

JNST

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In this paper a systematic study has been carried out on the influence of thickness on the physical properties of nanocrystalline nickel oxide (NiO) thin films prepared on glass substrate by spray pyrolysis method. The prepared nanocrystalline NiO films were characterized using X-ray diffraction technique (XRD), field emission scanning electron microscopy (FESEM) and optical measurement techniques. XRD patterns reveal the cubic structure for all the samples and the crystallite size varies with the thickness. FESEM images confirmed that all the films are homogeneous, without any crack, dense and exhibit almost complete coverage of the substrate. The optical parameters such as transmittance, absorption coefficient and energy band gap of the films as a function of film thickness was investigated by UV-Vis spectrophotometer. The band gap of the films is found to be direct allowed transition and the variation of band gap values of nanocrystalline NiO thin films were found to be in the range of 3.48 eV to 3.53 eV.

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Growth mechanism of single-crystalline NiO thin films grown by metal organic chemical vapor deposition

Cited by 30 publications

References 24 publications

The Nanosized Dye Adsorbents for Water Treatment

The Nanosized Dye Adsorbents for Water Treatment

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Study of Physical Properties of Nanocrystalline NiO Thin Films Prepared by Spray Pyrolysis Technique

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