2005
DOI: 10.1143/jjap.44.1585
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Growth Control of Carbon Nanotube using Various Applied Electric Fields for Electronic Device Applications

Abstract: The control of the growth direction of a carbon nanotube was accomplished by applying an electric field during the growth of the carbon nanotube. The effects of two types of applied bias, one is a constant DC bias, and the other is a ramp bias, on the control of the growth direction were examined. By maintaining a constant DC bias we could control the growth direction of the carbon nanotube, however, the bridging ratio between the two electrodes was as small as 35%. We suppose that this low bridging ratio may … Show more

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Cited by 10 publications
(6 citation statements)
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“…Thus far, only a few studies on the control of the orientation of SWNTs have been reported; [21][22][23][24][25][26][27][28] in these studies, the orientation of SWNTs have been controlled by the application of a strong electric field during the chemical vapor deposition (CVD) growth of SWNTs, [21][22][23][24] gas flow, 25) and the surface orientation of a quartz substrate. [26][27][28] However, these methods have the following drawbacks: [21][22][23][24][25][26][27][28] the application of a strong electric field during the CVD growth of SWNTs requires a complicated wiring structure, [21][22][23][24] the gas flow technique results in the growth of SWNTs only with a unidirectional orientation, 25) and quartz substrates are not suitable for use in conventional silicon processes. [26][27][28] In this study, a new technique to preferentially control the direction of the growth of SWNTs is proposed.…”
mentioning
confidence: 99%
“…Thus far, only a few studies on the control of the orientation of SWNTs have been reported; [21][22][23][24][25][26][27][28] in these studies, the orientation of SWNTs have been controlled by the application of a strong electric field during the chemical vapor deposition (CVD) growth of SWNTs, [21][22][23][24] gas flow, 25) and the surface orientation of a quartz substrate. [26][27][28] However, these methods have the following drawbacks: [21][22][23][24][25][26][27][28] the application of a strong electric field during the CVD growth of SWNTs requires a complicated wiring structure, [21][22][23][24] the gas flow technique results in the growth of SWNTs only with a unidirectional orientation, 25) and quartz substrates are not suitable for use in conventional silicon processes. [26][27][28] In this study, a new technique to preferentially control the direction of the growth of SWNTs is proposed.…”
mentioning
confidence: 99%
“…However, only very few reports on controlled orientation of nanowires of very limited material systems have been demonstrated. 14-20 Yang et al, 14 Maeda et al, 15 and Lee et al 16 realized controlled orientations of carbon nanotubes by applying an electric or a magnetic field on the substrates during growth. Ge et al prepared oriented Si nanowires by thermal evaporation method.…”
mentioning
confidence: 99%
“…For the horizontal direction growth, its success has been reported by many groups by using an electric field [43][44][45], a fast gas flow [46,47], and atomic steps of substrates [25,26,48,49,50,51] with other carbon sources. Furthermore, the ACCVD method has not been used for only random or VA-SWNTs, but also for horizontally-aligned SWNTs [52].…”
Section: Evaporation Methodsmentioning
confidence: 99%