2000
DOI: 10.1016/s0040-6090(00)00696-9
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Growth and transport properties of relaxed epilayers of InAs on GaAs

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Cited by 14 publications
(16 citation statements)
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“…For a thickness of 5 lm, InAs layer has a FWHM of 156 arcsec under the same substrate temperature. Przesławski et al (2000) reported a FWHM of 170 arcsec for a 5 lm-thick InAs layer. The poor crystalline quality at higher growth temperature is probably due to the formation of extended defects due to the evaporation of arsenic from the surface.…”
Section: Resultsmentioning
confidence: 99%
“…For a thickness of 5 lm, InAs layer has a FWHM of 156 arcsec under the same substrate temperature. Przesławski et al (2000) reported a FWHM of 170 arcsec for a 5 lm-thick InAs layer. The poor crystalline quality at higher growth temperature is probably due to the formation of extended defects due to the evaporation of arsenic from the surface.…”
Section: Resultsmentioning
confidence: 99%
“…In 0.53 Ga 0.47 As layers were deposited by MBE on SI-InP and GaAs as well as SI-GaAs. We carried out the calculations as described previously [3] for a few samples of InAs, In 0.53 Ga 0.47 As and GaAs with different charge carrier concentrations [3,[26][27][28][29][30][31][32]. The procedure consisted of the following steps:…”
Section: Methodsmentioning
confidence: 99%
“…We present a more detailed example of the calculation for an InAs sample measuring 9.0 m thick (see Tables 2, 4, 5, 6, and 7, and all figures) [28]. The InAs samples have the lowest (Table 2).…”
Section: Methodsmentioning
confidence: 99%
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