Growth and properties of PbTe films on porous silicon

Zimin, S. P.; Preobrazhensky, M.N; Zimin, Dmitri; Zaykina, R.F.; Borzova, G. A.; Наумов, В. В.

doi:10.1016/s1350-4495(99)00018-3

Cited by 17 publications

(8 citation statements)

References 12 publications

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“…This mosaic nature is responsible for yielding a number of reflections in XRD method. The observed result is in good agreement with earlier investigations [12,14]. Another effect of mosaic structure is to increase the intensity of the reflected beam, which is observed in Xray diffractograms as seen in Fig.…”

Section: Structuresupporting

confidence: 92%

Structural and dc conduction studies on PbTe thin films

Kungumadevi¹,

Rajasekar²,

Subbarayan³

et al. 2007

Ionics

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Lead Telluride (PbTe) films of different thickness were prepared onto precleaned glass substrates under the pressure of 2×10 −5 Torr by thermal evaporation. X-ray diffraction technique, scanning electron microscopy, and current-voltage characteristics were used to characterize the films. The structural analysis of the films was carried using X-ray diffractometer. The surface morphology was analyzed by using scanning electron microscope. The dc electrical conduction mechanism in vacuum-evaporated Al/PbTe/Al thin film sandwich system in the thickness range 500-5,000 Å at different temperature (303-483 K) was found to be a modified Poole-Frenkel type. The results of variation of activation energy with applied voltage and thickness are discussed.

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Section: Structuresupporting

confidence: 92%

Structural and dc conduction studies on PbTe thin films

Kungumadevi¹,

Rajasekar²,

Subbarayan³

et al. 2007

Ionics

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show abstract

“…The IR sensitivities of these materials are similar to that of Cd 1−x Hg x Te, but are easier to grow; more stable and homogeneity problems regarding the chemical composition are much less severe. Lead chalcogenide thin films have been deposited by various techniques, e.g., chemical bath deposition [2,3], chemical vapour deposition [4], electrodeposition [5], molecular beam epitaxy [6], atomic layer epitaxy [7], hot-wall epitaxy [8], vacuum evaporation [9], magnetron sputtering [10], to name a few. Out of these, electrodeposition is a simple and low cost thin film deposition method with several advantages [11].…”

Section: Introductionmentioning

confidence: 99%

An electrochemical technique to deposit thin films of PbTe

et al. 2006

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“…Furthermore, the use of PS layer as a substrate may provide a key for growing narrow gap semiconductors films such as PbTe [2]. For this purpose, it is necessary to perform a systematic study to find a suitable PS layer that releases the thermal stress and the lattice mismatch between the lead salt films and the silicon bulk.…”

Section: Introductionmentioning

confidence: 99%