2007
DOI: 10.1016/j.jcrysgro.2006.10.110
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Growth and post-growth rapid thermal annealing of InGaPN on GaP grown by metalorganic vapor phase epitaxy

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Cited by 3 publications
(3 citation statements)
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“…According to the above analysis and the experimental data [7,9,10,13,14], we obtained 1 b =0.5 eV and 2 b =6.0 eV. InGaNP.…”
Section: Resultsmentioning
confidence: 69%
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“…According to the above analysis and the experimental data [7,9,10,13,14], we obtained 1 b =0.5 eV and 2 b =6.0 eV. InGaNP.…”
Section: Resultsmentioning
confidence: 69%
“…for In x Ga 1x N y P 1y alloys in this work with the experimental data (The experimental data in ref. [14] has been corrected by the temperature shift [10,15]). The thermodynamic solubility of N and InGaP is very low, so phase separation, clustering and ordering are very common in InGaNP [9,10,16].…”
Section: Resultsmentioning
confidence: 99%
“…The key advantage of III-N-V/Si MJSCs is that the materials can be monolithically grown by MOVPE without metamorphic epilayers. However, the research on III-N-V/Si solar cell is still in the initial stage and faces many obstacles, such as heteroepitaxy of GaP layer on Si [14][15][16][17], fabrication of Si subcell [18][19][20][21] and growth of high quality III-N-V material [22][23][24][25][26]. In this paper, III-N-V/Si DJ solar cell is designed by integrating LM GaNAsP (or GaInNP) p-n junction on active-Si substrate.…”
Section: Introductionmentioning
confidence: 99%