The self-assembled InAsN quantum dots (QDs) were grown on the GaAs (001) substrates by MOVPE using 1,1-dimethlhydrazine (DMHy) and tertiarybutylarsine (TBAs) as the N and As precursors, respectively. The size distribution of the InAs(N) QDs grown at 450 °C and 420 °C is found bimodal. The InAsN QDs are typically 4-11 nm in height and 30-41 nm in width. The N incorporation into InAs induces the decrease of the QDs size, due to the increase of the wetting layer thickness. The density of the InAsN QDs with a nominal source supply of 2.6-3.0 ML, increases from 1.1-1.3×1010 cm -2 for the 450 °C growth to 2.1-2.3×10 10 cm -2 for the 420 °C growth. The photoluminescence peaks (at 300 K) of the InAs(N) QDs grown at both temperatures clearly show a red-shift to 1200 nm by N incorporation. This red-shift is in contrast with the blue-shift expected from the decrease in the dot sizes (quantum size effect), indicating the huge bandgap bowing induced by N incorporation is dominant over the quantum size effect.1 Introduction The laser devices based on the quantum dots are potentially useful due to the low threshold current density and high-temperature lasing characteristics [1]. To extend the emission wavelength of the InAs quantum dots (QDs) toward 1.3 µm and 1.55 µm for optical fiber communication systems, many efforts have been devoted. As in other III-V-N type alloys such as GaAsN and GaPN, InAsN is expected to have a large bandgap bowing, which will give a significant reduction of the bandgap with N incorporation. The bandgap reduction of InAsN films, however, is hindered due to the Burstein-Moss (B-M) effect, which causes the blue-shift of the absorption edge, induced by the high electron concentration associated with the N incorporation [2][3][4][5][6]. It has already been demonstrated that the occurrence of the B-M effect could be suppressed in the quantum well structure due to the step-like functional form of the two-dimensional density of states (DOS) of quantum wells [7][8][9]. Thus, the QDs structure could also suppress the B-M effect because of their delta functional form of the DOS even in the case of a rise in residual carrier concentration, and it is expected that the N incorporation into InAs QDs will extend the emission wavelength to the longer region. For this characteristic feature, several attempts to grow the InAsN QDs have been done with metalorganic vapor phase epitaxy (MOVPE) [10] and molecular beam epitaxy (MBE) [11,12]. In this work, the InAs(N) QDs grown by MOVPE have been investigated to elucidate the effect of N incorporation on the structural and photoluminescence (PL) properties.