Growth and mechanical anisotropy of TiN thin films

Meng, W. J.; Eesley, G. L.

doi:10.1016/0040-6090(95)06875-9

Cited by 93 publications

(27 citation statements)

References 23 publications

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“…Nanoindentation has been employed effectively for the study of anisotropic systems in materials science (Meng and Eesley, 1995;Turner et al, 1999). Data analysis procedures for hardness calculations do not need to change for anisotropic systems.…”

Section: Anisotropymentioning

confidence: 99%

Imaging and mechanical property measurements of kerogen via nanoindentation

Zeszotarski

Chromik

Vinci

et al. 2004

Geochimica et Cosmochimica Acta

114

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Section: Anisotropymentioning

confidence: 99%

Imaging and mechanical property measurements of kerogen via nanoindentation

Zeszotarski

Chromik

Vinci

et al. 2004

Geochimica et Cosmochimica Acta

114

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“…The values (397 GPa (0.35)) of TiN (222) reflection at RT are similar to the results (407 GPa (0.32)) that are also based on first principal from Zhang et al [37] for TiN (222) reflection. And the values (451 GPa (0.24)) for bulk TiN match with 469 GPa (0.25) [38], 427 GPa (0.19) [39], and 440 GPa [40]. These indicate that the elastic constants at RT in Refs.…”

Section: Macroscopic Stress-strain and Load Partitioningmentioning

confidence: 63%

Load partitioning between ferrite/martensite and dispersed nanoparticles of a 9Cr ferritic/martensitic (F/M) ODS steel at high temperatures

Zhang

Miao

et al. 2015

Materials Science and Engineering: A

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a b s t r a c tIn this study, a high-energy synchrotron radiation X-ray technique was used to investigate the tensile deformation processes of a 9Cr-ODS ferritic/martensitic (F/M) steel at different temperatures. Two minor phases within the 9Cr-ODS F/M steel matrix were identified as Y 2 Ti 2 O 7 and TiN by the high-energy X-ray diffraction, and confirmed by the analysis using energy dispersive X-ray spectroscopy (EDS) of scanning transmission electron microscope (STEM). The lattice strains of the matrix and particles were measured through the entire tensile deformation process. During the tensile tests, the lattice strains of the ferrite/ martensite and the particles (TiN and Y 2 Ti 2 O 7 ) showed a strong temperature dependence, decreasing with increasing temperature. Analysis of the internal stress at three temperatures showed that the load partitioning between the ferrite/martensite and the particles (TiN and Y 2 Ti 2 O 7 ) was initiated during sample yielding and reached to a peak during sample necking. At three studied temperatures, the internal stress of minor phases (Y 2 Ti 2 O 7 and TiN) was about 2 times that of F/M matrix at yielding position, while the internal stress of Y 2 Ti 2 O 7 and TiN reached about 4.5-6 times and 3-3.5 times that of the F/M matrix at necking position, respectively. It indicates that the strengthening of the matrix is due to minor phases (Y 2 Ti 2 O 7 and TiN), especially Y 2 Ti 2 O 7 particles. Although the internal stresses of all phases decreased with increasing temperature from RT to 600°C, the ratio of internal stresses of each phase at necking position stayed in a stable range (internal stresses of Y 2 Ti 2 O 7 and TiN were about 4.5-6 times and 3-3.5 times of that of F/M matrix, respectively). The difference between internal stress of the F/M matrix and the applied stress at 600°C is slightly lower than those at RT and 300°C, indicating that the nanoparticles still have good strengthening effect at 600°C.

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“…TiN that grows almost completely textured growth of (111) TiN on Si(100) is achieved. 19 Narayan et al 20 had reported epitaxial growth of TiN on Si(100) by laser ablation with the cube-on-cube orientation (TiN [l00]//Si[100]). In this study, although the TiN film grown on Si(100) shows strong cube-oncube orientational order, epitaxial growth is not achieved at temperatures as low as 150°C.…”

Section: Resultsmentioning

confidence: 99%

Structural and mechanical investigations of magnetron sputtering TiO2/Ti/TiN multilayer films on Si(100) substrate

2010

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TiO 2 /Ti/TiN multicompositional coating was prepared by DC reactive magnetron sputtering (MS) at a temperature of 150°C using a combination of a Ti metal target and a pure Ar, an Ar-O 2 mixture, or an Ar-N 2 mixture discharge gas, onto a Silicon(100) substrate. This system represents nano-structured multilayer substrate model for biomedical application as well as substrate models to reproduce the bulk titanium surface. This substrate model (Ti/TiN/Si(100)) makes possible and easy mechanical and microscopic characterization in particular for transmission electron microscopy after biocompatible test. The model multilayer TiO 2 /Ti/TiN/(100) was obtained after preparation of two intermediate samples: TiN/Si(100) and Ti/TiN/ Si(100). Structural (X-ray diffraction), morphological (scanning electron and atomic force microscopy) as well as mechanical (hardness and elastic modulus) studies of the MS films were performed.

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Growth and mechanical anisotropy of TiN thin films

Cited by 93 publications

References 23 publications

Imaging and mechanical property measurements of kerogen via nanoindentation

Imaging and mechanical property measurements of kerogen via nanoindentation

Load partitioning between ferrite/martensite and dispersed nanoparticles of a 9Cr ferritic/martensitic (F/M) ODS steel at high temperatures

Structural and mechanical investigations of magnetron sputtering TiO2/Ti/TiN multilayer films on Si(100) substrate

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